Features

Videos: Autumn 2017 Edition of the Fine Line Video Journal, October 10, 2017
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Video: Semiconductor Mask Making Trends… a conversation with Aki Fujimura of the eBeam Initiative by Dan Hutcheson [September 12, 2017]
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Survey: 2017 eBeam Initiative Mask Maker Survey Results [September 11, 2017]
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Survey: eBeam Initiative Perceptions Survey Results [September 11, 2017]
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Presentation: What’s Different about EUV Masks? by Tom Faure from GLOBALFOUNDRIES, presented at eBeam Initiative “BACUS” Reception [September 11, 2017]
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Press: eBeam Initiative Surveys Report Greatly Increased Optimism for EUV Lithography and New Photomask Trends at Leading-Edge Process Nodes, September 11, 2017
>> Download PDF (English, Japanese, Traditional Chinese & Simplified Chinese)

Events: Save the Date for the 2017 eBeam Initiative BACUS Reception: Monday, September 11 from 5:15pm – 7:30pm in Monterey, California; Please RSVP by September 1 and we’ll send you the details!
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Videos: Summer 2017 Edition of the Fine Line Video Journal, June 26, 2017
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Events: PMJ 2017 April 5 14:50-16:10 Session 3 Use of GPU in Mask Making (I); 16:30-18:00 Session 4 Use of GPU in Mask Making (II)
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Tom Faure of GLOBALFOUNDRIES explains what’s new and different with EUV masks


Jed Rankin, co-chair of next year’s SPIE Photomask Technology Symposium, shares his predictions on EUV


Aki Fujimura, CEO of D2S, provides his takeaways from the latest eBeam Initiative surveys and more; also in Japanese


Leo Pang, chief product officer of D2S, also recaps these developments in Chinese


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eBeam Industry News

Solid State Technology: EUV Leads the Next Generation Litho Race [October 20, 2017]
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Semiconductor Engineering: Next-Gen Mask Writer Race Begins [October 19, 2017]
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Semiconductor Engineering: Searching for EUV Mask Defects [October 19, 2017]
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Semiconductor Engineering: Challenges Mount for Photomasks by Mark LaPedus [September 21, 2017]
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EE Times: Chip Execs More Bullish on EUV by Rick Merritt [September 11, 2017] (and in Chinese)
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Semiconductor Engineering: Survey: Optimism Grows for EUV by Mark LaPedus [September 11, 2017]
>> View

Solid State Engineering: eBeam Initiative Surveys Report Increased Optimism for EUV and New Photomask Trends [September 11, 2017]
>> View


>>View News Archive

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