Features

Event: Photomask Japan 2018 - eBeam Initiative survey results to be presented April 19, 2018
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Video: Spring 2018 Edition of the Fine Line Video Journal, March 21, 2018
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Presentation: Multi-beam mask writer MBM-1000 for advanced mask making presented by Hiroshi Matsumoto, NuFlare Technology, at SPIE eBeam lunch [February 27, 2018]
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Presentation: Frontiers in CD-SEM metrology presented by Sergey Babin, aBeam Technologies, at SPIE eBeam lunch [February 27, 2018]
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Presentation: Mask patterning challenges for EUV N7 and beyond presented by Mike Green, Photronics, at SPIE eBeam lunch [February 27, 2018]
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Events: eBeam Initiative Annual Lunch and Members Meeting at SPIE 2018, San Jose Hilton, Tuesday, February 27, 2018
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Events: Leti Alternative Lithography Workshop with co-sponsors Screen and eBeam Initiative, San Jose Marriott, Thursday, March 1 from 5-9pm
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Videos: Autumn 2017 Edition of the Fine Line Video Journal, October 10, 2017
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Video: Semiconductor Mask Making Trends… a conversation with Aki Fujimura of the eBeam Initiative by Dan Hutcheson [September 12, 2017]
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Survey: 2017 eBeam Initiative Mask Maker Survey Results [September 11, 2017]
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura, CEO of D2S, talks about EUV shot noise and other SPIE takeaways; also in Japanese; also in Chinese


Hiroshi Matsumoto of NuFlare Technology provides an overview of inline pixel-level dose correction (PLDC) for the NuFlare MBM-1000 multi-beam mask writer


Laurent Pain of Leti celebrates 50 years of innovation at Leti and reviews key topics from Leti’s new workshop at SPIE


Sergey Babin of aBeam Technologies presents on new developments in CD-SEM metrology


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eBeam Industry News

Semiconductor Engineering: Experts at the Table, part 3: More Lithography/Mask Challenges with Applied Materials, DNP, D2S, GlobalFoundries, imec [May 16, 2018]
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Semiconductor Engineering: Searching for EUV Defects by Mark LaPedus [April 19, 2018]
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Semiconductor Engineering: Experts at the Table, part 2: More Lithography Mask Challenges – Roundtable [April 17, 2018]
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Semiconductor Engineering: What Happened to Nanoimprint Litho? By Mark LaPedus [March 29, 2018]
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Semiconductor Engineering: EUV’s New Problem Areas by Mark LaPedus [March 19, 2018]
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Semiconductor Engineering: Experts at the Table, Part 1 – More Lithography/Mask Challenges by Mark LaPedus [March 15, 2018]
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Semiconductor Engineering: Transistor Options Beyond 3nm by Mark LaPedus [February 15, 2018]
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