Features

Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 18 with Drinks reception at 5:45pm and program at 6:30pm
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Event: EMLC 2018 - presentations by various eBeam Initiative members June 18-20, Grenoble, France
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Event: The Litho Workshop - presentations by eBeam Initiative members June 17-21, Sun Valley, Idaho, USA
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Video: Summer 2018 Edition of the Fine Line Video Journal, June 7, 2018
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Event: Photomask Japan 2018 - eBeam Initiative survey results to be presented April 19, 2018
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Video: Spring 2018 Edition of the Fine Line Video Journal, March 21, 2018
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Presentation: Multi-beam mask writer MBM-1000 for advanced mask making presented by Hiroshi Matsumoto, NuFlare Technology, at SPIE eBeam lunch [February 27, 2018]
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Presentation: Frontiers in CD-SEM metrology presented by Sergey Babin, aBeam Technologies, at SPIE eBeam lunch [February 27, 2018]
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Presentation: Mask patterning challenges for EUV N7 and beyond presented by Mike Green, Photronics, at SPIE eBeam lunch [February 27, 2018]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Mike Green of Photronics on EUV mask patterning


Steve Teig from Xperi on Deep Learning


Aki Fujimura of D2S on Semiconductor and Photomask Growth; also in Japanese


Leo Pang of D2S on Industry Growth in Chinese


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eBeam Industry News

Semiconductor Engineering: Big Trouble At 3nm [June 21, 2018]
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Semiconductor Engineering: What’s Missing in EUV? [May 17, 2018]
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Semiconductor Engineering: Experts at the Table, part 3: More Lithography/Mask Challenges with Applied Materials, DNP, D2S, GlobalFoundries, imec [May 16, 2018]
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Semiconductor Engineering: Searching for EUV Defects by Mark LaPedus [April 19, 2018]
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Semiconductor Engineering: Experts at the Table, part 2: More Lithography Mask Challenges – Roundtable [April 17, 2018]
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Semiconductor Engineering: What Happened to Nanoimprint Litho? By Mark LaPedus [March 29, 2018]
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Semiconductor Engineering: EUV’s New Problem Areas by Mark LaPedus [March 19, 2018]
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