Mr. Kiichi Sakamoto is General Manager of Nanotechnology 1st Business Division at Advantest Corporation. In 1984, he graduated from St.Paul University, Japan, with a BS degree in physics and joined Fujitsu Ltd. He started as an LSI process engineer using e-beam direct writing (EBDW) systems. After that, he was involved in the development of a new e-beam system using block (character) exposure, which was introduced in 1998 and which forms the basis of current CP (Character Projection) technologies. In 1997, he moved to Advantest along with the e-beam system technologies and staff. After serving in various management positions within e-beam system engineering or development, he became General Manager in 2006.