The eBeam Initiative

Features

Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
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Presentation: eBeam Inspection and Metrology: Developments and Applications in Lithography by Yu Cao, ASML, eBeam Initiative lunch [February 28, 2023]
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Press: EUV TECH and IBM Join the eBeam Initiative [February 28, 2023]
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Survey: 2023 Deep Learning Applications List by eBeam Initiative members [February 28, 2023]
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Videos: Winter 2023 Fine Line Video Journal [January 10, 2023]
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Videos: Autumn 2022 Fine Line Video Journal [November 1, 2022]
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Presentation: O(p): GPUs, Pixels, DL, Curvy Masks & Designs by Aki Fujimura, D2S, eBeam Initiative Reception [September 27, 2022]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura puts on his D2S hat to explain the advantages of pixel-based computing with GPU acceleration.	Abhishek Shendre of D2S presents the Best Paper awarded at SPIE Photomask 2022.
Jan Willis, co-founder of the eBeam Initiative, recaps the results of the 11th annual Luminaries Survey.	Aki Fujimura, CEO of D2S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.
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eBeam Industry News

Semiconductor Engineering: Evolution of the EUV Ecosystem Reflected at 2023 Advanced Lithography Patterning [March 16, 2023]
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Semiconductor Digest: EUV Tech and IBM Join the eBeam Initiative [March 1, 2023]
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Semiconductor Engineering: Mapping the Future of Lithography [February 16, 2023]
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BACUS News: Editorial – Thomas Scherübl, Carl Zeiss SMT GmbH, on best mask size for High-NA EUV; Featured Article – 2022 BACUS Best Paper by D2S [January 7, 2023]
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SPIE: BACUS December webinar now online (login required) – “Carbon Nanotube Pellicles for EUV Lithography: Form, Function, and Progress” presented by Emily Gallagher of imec [January 7, 2023]
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SPIE: eBeam Initiative members Recognized as SPIE Fellows [January 5, 2023]
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Semiconductor Engineering: Multi-beam Mask Writers are a Game Changer [December 22, 2022]
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