Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
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Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
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Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
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Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
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Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
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Press:
eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
>> English,
Japanese &
Simplified Chinese
Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press:
Micron Joins the eBeam Initiative [February 25, 2020]
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020
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>>View Features Archive
Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
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Semiconductor Engineering: Breaking The 2nm Barrier [February 18, 2021]
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Semiconductor Engineering: AI and High-NA EUV at 3/2/1nm [December 16, 2020]
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VLSI Research: Dan Hutcheson’s video interview with Aki Fujimura about the 2020 eBeam Initiative surveys [Dec 15, 2020]
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Semiconductor Engineering: Challenges Linger for EUV [November 11, 2020]
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Semiconductor Engineering: Mask/Lithography Issues for Mature Nodes [October 22, 2020]
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Mynavi News: How will the semiconductor mask industry change with the practical application of EUV? By Takeshi Hattori [Oct 13, 2020]
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Semiconductor Digest: Multibeam Unveils Major Initiative to Develop Full-Wafer All-Maskless Patterning at 45nm and Larger Nodes on Its MEBL Production System [September 10, 2020]
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>>View News Archive