Videos: Autumn 2023 Fine Line Video Journal [October 24, 2023]
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Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
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Survey: eBeam Initiative Luminaries Survey Results [October 3, 2023]
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Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
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Press: eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks [October 3, 2023]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023
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Presentation: DAC 2023 - Why is Curvy Design an Opportunity Now? Panel Slides [July 11, 2023]
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Video: Summer 2023 Fine Line Video Journal [June 13, 2023]
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Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
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Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
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Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
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Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Read the story of the eBeam Initiative
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
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Semiconductor Engineering: Center For Deep Learning In Electronics Manufacturing: Bringing Deep Learning To Production For Photomask Manufacturing [November 16, 2023]
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Semiconductor Engineering: Why Curvy Design Now? Less Change Than You Think And Manufacturable Today [October 19, 2023]
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Semiconductor Engineering: Big Changes Ahead For Photomask Technology [October 19, 2023]
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Semiconductor Digest: eBeam Initiative Survey Reports Semiconductor Industry Luminaries Are Confident in High-NA EUV and Curvilinear Photomasks [October 4, 2023]
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Semiconductor Engineering: High-NA EUV Progress and Problems: Video interview with Harry Levinson, HJL Lithography [August 22, 2023]
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Semiconductor Engineering: High-NA Lithography Starting To Take Shape [July 25, 2023]
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Semiconductor Engineering: Multi-Beam Writers are Driving EUV Mask Development – Highlights from EMLC 2023 [July 25, 2023]
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