Event:
Replay of video - eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
View:
>> Entire event (1h 22m)
>> Luminaries survey results (14m)
>> Mask revenues (12m)
>> EUV mask (21m)
>> Mask writers (12m)
>> Deep Learning (DL) (10m)
>> Curvilinear masks (6m)
Survey: 2021 eBeam Initiative Luminaries Survey Results [September 28, 2021]
>> View
Press:
eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
>> English,
Japanese
Simplified Chinese &
Traditional Chinese
Event: eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
>> RSVP
Video: Summer 2021 Fine Line Video Journal [June 22, 2021]
>> View
Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
>> View
Video: Spring 2021 Fine Line Video Journal [March 23, 2021]
>> View
Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
>> View
Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
>> View
Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
>> View
Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
>> View
Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
>> View
Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
>> View
Press:
eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
>> English,
Japanese &
Simplified Chinese
Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
>> View
Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
>> View
Press:
Micron Joins the eBeam Initiative [February 25, 2020]
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
>>View Features Archive
Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
|
|
|
|
|
|
Semiconductor Digest: Applied Materials Unveils eBeam Metrology System that Enables a New Playbook for Patterning Advanced Logic and Memory Chips [October 19, 2021]
>> View
Semiconductor Digest: eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
>> View
SPIE Journal of Micro/Nanopatterning, Materials, Metrology: Inverse lithography technology: 30 years from concept to practical, full-chip reality by Leo Pang, D2S [August 31, 2021]
>> View
Semiconductor Engineering: Optimizing VSB Shot Count for Curvilinear Masks [August 19, 2021]
>> View
Semiconductor Engineering: What About Mask Rule Checking for Curvilinear Photomasks? [July 22, 2021]
>> View
Semiconductor Engineering: Finding, Predicting EUV Stochastic Defects [June 17, 2021]
>> View
Semiconductor Engineering: Developing a New Curvilinear Data Format [June 17, 2021]
>> View
>>View News Archive