Features

Presentation: O(p): GPUs, Pixels, DL, Curvy Masks & Designs by Aki Fujimura, D2S, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear Masks in Memory for DUV and EUV by Ezequiel Russell, Micron, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear MPC in Zero Time by Noriaki Nakayamada, NuFlare, eBeam Initiative Reception [September 27, 2022]
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Survey: 2022 eBeam Initiative Luminaries Survey Results [September 27, 2022]
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Press: eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth [September 27, 2022]
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Event: eBeam Initiative reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:00-7:30pm Sept. 27, 2022
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Videos: Summer 2022 Fine Line Video Journal [June 28, 2022]
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Videos: Spring 2022 Fine Line Video Journal [April 19, 2022]
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Event: Replay of video - eBeam Initiative 14th Annual (Virtual) Event with Aki Fujimura of D2S, Donis Flagello of Nikon, Chris Mack of Fractilia, Harry Levinson of HJL Lithography, and Mike Hermes of Micron [March 1, 2022]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura, CEO of D2S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.


Ezequiel Russell of Micron makes the case for adopting curvilinear masks for DUV and EUV in advanced memory design.


Noriaki Nakayamada of NuFlare Technology explains the advantages of using pixel-level dose correction (PLDC).


Aki Fujimura, CEO of D2S, sits down with industry luminary Naoya Hayashi, DNP Fellow, to celebrate his retirement


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eBeam Industry News

Semiconductor Engineering: High-NA EUV Complicates EUV Photomask Future [November 17, 2022]
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Semiconductor Engineering: Video: Why changes in computing are driving changes in photomasks
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Semiconductor Engineering: 2022 Survey: Luminaries report positive EUV impact on mask trends
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Semiconductor Digest: eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth [September 27, 2022]
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Semiconductor Engineering: How Overlay Keeps Pace with EUV Patterning [August 9, 2022]
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SPIE: eBeam Initiative members among 77 New Senior Members Named by SPIE [August 2, 2022]
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Design With Calibre: Curves ahead for IC manufacturing [June 20, 2022]
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