The eBeam Initiative

Features

Videos: Autumn 2026 Fine Line Video Journal [October 1, 2026]
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Survey: 2026 eBeam Initiative Luminaries Survey Results [September 9, 2026]
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Presentation: Photomask Ecosystem – Current Status and Issues, Naoya Hayashi, DNP Honorary Fellow [September 9, 2026]
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Press: eBeam Initiative Survey Predicts a Bright Outlook for the Photomask Industry [September 9, 2026]
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Videos: Breaking news from SPIE BACUS workshop on Large Format Masks [September 7, 2026]
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Event: [Note it’s on a Wednesday] eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; Wednesday Sept. 9, 2026
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Videos: Summer 2026 Fine Line Video Journal [June 11, 2026]
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Videos: Spring 2026 Fine Line Video Journal [March 25, 2026]
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Presentation: Only Entirely Curvilinear Masks are Entirely Manufacturable Masks, Aki Fujimura, D2S [February 24, 2026]
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Survey: 2026 Deep Learning/LLM Applications List by eBeam Initiative members [February 24, 2026]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 24, 2026
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Survey: 2025 eBeam Initiative Luminaries Survey Results [September 23, 2025]
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Presentation: Technology Analysis of Leading-Edge Semiconductor Manufacturing, Tetsuya Wadaki, Morgan Stanley MUFG [September 23, 2025]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 5:00–7:15pm Sept. 23, 2025
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches based on electron beam (eBeam) technologies. The goals of the eBeam Initiative are to reduce the barriers to adoption to enable more IC design starts and faster time-to-market while increasing the investment in eBeam technologies.

Read the story of the eBeam Initiative

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura, CEO of D2S, speaks with Christof Klein, former COO at IMS Nanofabrication and now a consultant at advisory firm iunctio.partners, on a range of topics. Christof demystifies pixel-level dose correction (PLDC) and dynamic max dose (DMD).	Jan Willis, co-founder of the eBeam Initiative, presents the results of this year’s Luminaries Survey. Naoya Hayashi of DNP, Harry Levinson of HJL Lithography, and Glen Scheid of Micron debate the results of this year’s survey.
Abhishek Shendre of D2S introduces the DMD feature in PLDC to improve mask uniformity with no impact on mask write times. This is a recording of his paper given at BACUS SPIE Photomask.	Naoya Hayashi, DNP Honorary Fellow, advocates for a strong photomask ecosystem and sustainable supply chain in the face of the AI “Gold Rush” in his invited talk at the eBeam Initiative event at BACUS SPIE Photomask.
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eBeam Industry News

EE Times: Intel Puts High-NA EUV into Production, but Stitching Still Has Something to Prove
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Semiecosystem: Mask Makers Upbeat, New Mask Size Gains Steam by Mark LaPedus
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Semiconductor Engineering: News from this week’s SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference
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Business Insider: ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV
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Semiecosystem: Multibeam Debuts Next-Gen E-Beam Lithography Tool by Mark LaPedus [July 23, 2026]
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Semiconductor Engineering: Mask Economics Shape High-NA EUV Adoption [June 22, 2026]
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Semiecosystem: Latest News in Lithography by Mark LaPedus [June 7, 2026]
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