Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
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Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
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Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
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Press: eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
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Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
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Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020

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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Dr. Harry Levinson of HJL Lithography shares his impressions of the SPIE Photomask Technology + EUV Lithography Conference; Leo Pang’s impressions in Chinese

Aki Fujimura highlights results of the sixth annual eBeam Initiative Mask Makers survey; Jan Willis shares the results of the ninth annual eBeam Initiative Luminaries survey

Leo Pang presents the results of a joint paper with Micron Technology on how to enable faster VSB writing of 193i curvilinear ILT masks

Ajay Baranwal, director of the Center for Deep Learning in Electronics Manufacturing (CDLe), demonstrates the use of digital twins to create SEM images

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eBeam Industry News

Semiconductor Engineering: AI and High-NA EUV at 3/2/1nm [December 16, 2020]
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VLSI Research: Dan Hutcheson’s video interview with Aki Fujimura about the 2020 eBeam Initiative surveys [Dec 15, 2020]
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Semiconductor Engineering: Challenges Linger for EUV [November 11, 2020]
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Semiconductor Engineering: Mask/Lithography Issues for Mature Nodes [October 22, 2020]
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Mynavi News: How will the semiconductor mask industry change with the practical application of EUV? By Takeshi Hattori [Oct 13, 2020]
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Semiconductor Digest: Multibeam Unveils Major Initiative to Develop Full-Wafer All-Maskless Patterning at 45nm and Larger Nodes on Its MEBL Production System [September 10, 2020]
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Semiconductor Engineering: Finding Defects with eBeam Inspection [August 20, 2020]
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