Features

Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
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Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020
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Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
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Survey: 2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
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Survey: eBeam Initiative Perceptions Survey Results [September 17, 2019]
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Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
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Press: eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Leo Pang of D2S reviews a GPU-accelerated approach to curvilinear ILT and how the mask could be written with VSB machines


Ezequiel Russell of Micron, the newest member of the eBeam Initiative, answers the questions “Why curvilinear masks? Why now?”


Aki Fujimura of D2S with SPIE AL 2020 highlights, including EUV, Deep Learning, curvilinear masks; also in Japanese


Thomas Kurian of Mycronic describes his company's new laser-based multi-beam photomask writers as well as his deep learning work at CDLe.


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eBeam Industry News

anandtech.com: ASML’s First Multi-Beam Inspection Tool for 5nm [June 1, 2020]
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Semiconductor Engineering: What’s Next With AI In Fabs? [April 22, 2020]
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Semiconductor Engineering: How And Where ML Is Being Used In IC Manufacturing? [April 1, 2020]
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Semiconductor Engineering: What Machine Learning Can Do in Fabs? [March 25, 2020]
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Semiconductor Digest: Micron joins the eBeam Initiative [February 25, 2020]
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Semiconductor Engineering: Multi-Patterning EUV Vs. High-NA EUV [December 4, 2019]
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Semiconductor Engineering: Making and Protecting Advanced Masks [November 27. 2019]
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