Videos: Winter 2023 Fine Line Video Journal [January 10, 2023]
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Videos: Autumn 2022 Fine Line Video Journal [November 1, 2022]
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Presentation: O(p): GPUs, Pixels, DL, Curvy Masks & Designs by Aki Fujimura, D2S, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear Masks in Memory for DUV and EUV by Ezequiel Russell, Micron, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear MPC in Zero Time by Noriaki Nakayamada, NuFlare, eBeam Initiative Reception [September 27, 2022]
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Survey: 2022 eBeam Initiative Luminaries Survey Results [September 27, 2022]
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Press:
eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth [September 27, 2022]
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Japanese,
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Event: eBeam Initiative reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:00-7:30pm Sept. 27, 2022
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Videos: Summer 2022 Fine Line Video Journal [June 28, 2022]
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Videos: Spring 2022 Fine Line Video Journal [April 19, 2022]
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Event: Replay of video - eBeam Initiative 14th Annual (Virtual) Event with Aki Fujimura of D2S, Donis Flagello of Nikon, Chris Mack of Fractilia, Harry Levinson of HJL Lithography, and Mike Hermes of Micron [March 1, 2022]
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
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BACUS News: Editorial – Thomas Scherübl, Carl Zeiss SMT GmbH, on best mask size for High-NA EUV; Featured Article – 2022 BACUS Best Paper by D2S [January 7, 2023]
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SPIE: BACUS December webinar now online (login required) – “Carbon Nanotube Pellicles for EUV Lithography: Form, Function, and Progress” presented by Emily Gallagher of imec [January 7, 2023]
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SPIE: eBeam Initiative members Recognized as SPIE Fellows [January 5, 2023]
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Semiconductor Engineering: Multi-beam Mask Writers are a Game Changer [December 22, 2022]
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Semiconductor Engineering: High-NA EUV Complicates EUV Photomask Future [November 17, 2022]
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Semiconductor Engineering: Video: Why changes in computing are driving changes in photomasks
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Semiconductor Engineering: 2022 Survey: Luminaries report positive EUV impact on mask trends
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