The eBeam Initiative

Features

Presentation: Full-Reticle Curvilinear Inline Linearity Correction Including Variable Bias with Zero Turnaround Time by Paris Spinelli, Micron, at PMJ 2025 [April 18, 2025]
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Presentation: Three Ways to Improve Wafer Uniformity by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
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Videos: Spring 2025 Fine Line Video Journal [March 26, 2025]
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Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
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Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative. Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
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Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
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Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025

Videos: Autumn 2024 Fine Line Video Journal [October 28, 2024]
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Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches based on electron beam (eBeam) technologies. The goals of the eBeam Initiative are to reduce the barriers to adoption to enable more IC design starts and faster time-to-market while increasing the investment in eBeam technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Leo Pang of D2S provides his takeaways from Photomask Japan (PMJ), including Best Paper and Best Poster topic PLDC.	Paris Spinelli of Micron demonstrates in a PMJ Best Paper how PLDC improves mask linearity including variable bias with no increase in turnaround time.
Chris Progler of Photronics explains mask IQ (image quality), including its benefits and potential bottlenecks.	Emily Gallagher of imec reprises her keynote from SPIE-AL on climate-aware IC manufacturing.
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eBeam Industry News

Semiconductor Engineering: Mask Complexity, Cost and Change – eBeam Initiative Roundtable [May 22, 2025]
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Photomask Japan: eBeam Initiative Members Named in Best Paper and Best Poster Awards at PMJ 2025 [May 20, 2025]
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Semiconductor Digest: Curvilinear Technology: A Game Changer for the Logic Technology Roadmap by Ryoung-Han Kim, imec [May 13, 2025]
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Semiconductor Engineering: Three Ways Curvy ILT Together With PLDC Improves Wafer Uniformity [April 15, 2025]
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Semiconductor Engineering: Reflecting on the SPIE Advanced Lithography + Patterning Symposium 2025 by Dr. Harry Levinson [March 20, 2025]
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Semiconductor Engineering: EUV’s Future Looks Even Brighter [February 20, 2025]
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Semiconductor Engineering: Improving Uniformity and Linearity for All Masks by Aki Fujimura, D2S [January 29, 2025]
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