Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press:
Micron Joins the eBeam Initiative [February 25, 2020]
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Japanese,
Simplified Chinese,
& Traditional Chinese
Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020
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Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
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Survey:
2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
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Survey:
eBeam Initiative Perceptions Survey Results [September 17, 2019]
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Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
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Press:
eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
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Japanese,
Simplified Chinese,
& Traditional Chinese
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
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anandtech.com: ASML’s First Multi-Beam Inspection Tool for 5nm [June 1, 2020]
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Semiconductor Engineering: What’s Next With AI In Fabs? [April 22, 2020]
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Semiconductor Engineering: How And Where ML Is Being Used In IC Manufacturing? [April 1, 2020]
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Semiconductor Engineering: What Machine Learning Can Do in Fabs? [March 25, 2020]
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Semiconductor Digest: Micron joins the eBeam Initiative [February 25, 2020]
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Semiconductor Engineering: Multi-Patterning EUV Vs. High-NA EUV [December 4, 2019]
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Semiconductor Engineering: Making and Protecting Advanced Masks [November 27. 2019]
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>>View News Archive