Features

Video: Summer 2021 Fine Line Video Journal [June 22, 2021]
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Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
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Video: Spring 2021 Fine Line Video Journal [March 23, 2021]
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Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
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Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
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Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
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Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
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Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
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Press: eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
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Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
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Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura of D2S interviews Vivek Singh about his new role as VP, Advanced Technology Group at NVIDIA


Thomas Cecil of Synopsys explains the benefits of curvilinear ILT mask synthesis.


Peter Buck of Siemens Digital Industries Software makes the case for a new standard for curvilinear data.


Leo Pang of D2S recaps in Chinese a joint paper with Micron Technology on enabling faster VSB writing of 193i curvilinear ILT masks. Also in English.


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eBeam Industry News

Semiconductor Engineering: What About Mask Rule Checking for Curvilinear Photomasks? [July 22, 2021]
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Semiconductor Engineering: Finding, Predicting EUV Stochastic Defects [June 17, 2021]
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Semiconductor Engineering: Developing a New Curvilinear Data Format [June 17, 2021]
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Semiconductor Engineering: How will the Adoption of Curvilinear Masks Affect Turnaround Time? [June 1, 2021]
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Semiconductor Engineering: Is the Photomask Ecosystem Ready for Curvilinear ILT? [May 18, 2021]
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Semiconductor Engineering: What’s Next in Fab Tool Technologies? [May 12, 2021]
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Semiconductor Engineering: How Extensively will Curvilinear ILT be used for EUV Photomasks? [April 29, 2021]
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