Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 17, 2019
>> RSVP
Video: Summer 2019 Edition of the Fine Line Video Journal [June 5, 2019]
>> View
Video: Spring 2019 Edition of the Fine Line Video Journal [March 26, 2019]
>> View
Presentation: The need for speed: Computations for EUV Lithography by Harry Levinson, HJL Lithography, at SPIE eBeam lunch [February 26, 2019]
>> View
Presentation: How GPU-Accelerated Simulation Enables Applied Deep Learning for Photomasks by Leo Pang, D2S, at SPIE eBeam lunch [February 26, 2019]
>> View
Presentation: Applications of Machine Learning in Computational Lithography by Yu Cao, ASML, at SPIE eBeam lunch [February 26. 2019]
>> View
Press:
ASML Joins the eBeam Initiative, Feb 26, 2019
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Event: eBeam Initiative Annual Lunch and Members Meeting at SPIE 2019, San Jose Hilton, Tuesday, February 26, 2019
>> RSVP
Video: Autumn 2018 Edition of the Fine Line Video Journal, October 16, 2018
>> View
Survey: 2018 eBeam Initiative Mask Maker Survey Results [September 18, 2018]
>> View
Survey: 2018 eBeam Initiative Perceptions Survey Results [September 18, 2018]
>> View
Presentation: Renew, Retire, Replace by Franklin Kalk, Toppan Photomasks, at BACUS eBeam Reception [September 18, 2018]
>> View
>>View Features Archive
Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
|
|
|
|
|
|
Semiconductor Engineering: EUV, Deep Learning Issues In Mask Making [July 1, 2019]
>> View
Semiconductor Engineering: EUV Mask Gaps and Issues [May 8, 2019]
>> View
Semiconductor Engineering: Single vs Multi-Patterning EUV [March 25, 2019]
>> View
Semiconductor Engineering: EUV mask readiness challenges [March 21, 2019]
>> View
Semiconductor Engineering: ASML Joins the eBeam Initiative, IMS presents SPIE-AL paper on the next generation MBMW-201 [March 1, 2019]
>> View
Solid State Technology: ASML Joins the eBeam Initiative [February 26, 2019]
>> View
tsmc.com: TSMC Recognizes Outstanding Suppliers at Supply Chain Management Forum [December 6, 2018]
>> View
>>View News Archive