Features

Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
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Video: Spring 2021 Fine Line Video Journal [March 23, 2021]
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Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
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Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
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Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
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Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
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Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
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Press: eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
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Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
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Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura of D2S interviews Harry Levinson of HJL Lithography on his takeaways from the SPIE Advanced Lithography Conference. Leo Pang of D2S offers his perspective on the conference highlights in Chinese.


Yuichiro Yamazaki of TASMIT, one of our newest members, explains how NGR massive eBeam metrology and inspection supports cutting-edge wafer processes and applications.


Noriaki Nakayamada of NuFlare Technology provides the latest results of writing curvilinear masks with NuFlare’s MBM-2000 multi-beam mask writer, which uses a new data format supporting curvy shapes.


Aki Fujimura of D2S hosts a virtual panel discussion about curvilinear masks with industry luminaries Ezequiel Russell of Micron Technology, Noriaki Nakayamada of NuFlare Technology, and Danping Peng of TSMC during SPIE-AL 2021.


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eBeam Industry News

Semiconductor Engineering: How will the Adoption of Curvilinear Masks Affect Turnaround Time? [June 1, 2021]
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Semiconductor Engineering: Is the Photomask Ecosystem Ready for Curvilinear ILT? [May 18, 2021]
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Semiconductor Engineering: What’s Next in Fab Tool Technologies? [May 12, 2021]
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Semiconductor Engineering: How Extensively will Curvilinear ILT be used for EUV Photomasks? [April 29, 2021]
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Semiconductor Engineering: The Quest for Curvilinear Photomasks [April 15, 2021]
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Semiconductor Engineering: How do Multi-Beam Mask Writers Enable Curvilinear Shapes on Photomasks? [April 15]
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Semiconductor Engineering: Applications, Challenges for Using AI in Fabs [April 14, 2021]
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