The eBeam Initiative

Features

Videos: Autumn 2023 Fine Line Video Journal [October 24, 2023]
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Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
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Survey: eBeam Initiative Luminaries Survey Results [October 3, 2023]
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Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
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Press: eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks [October 3, 2023]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023
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Presentation: DAC 2023 - Why is Curvy Design an Opportunity Now? Panel Slides [July 11, 2023]
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Video: Summer 2023 Fine Line Video Journal [June 13, 2023]
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Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
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Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
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Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
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Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura, CEO of D2S, recaps why manufacturing curvy masks makes curvy design now possible along with key points on the benefits and barriers made by the DAC panel.	Glen Scheid of Micron Technology examines the photomask economy in three essential segments: capital equipment, materials, and software.
Jan Willis presents the results of this year’s Luminaries Survey on future business and technology trends.	Chris Progler from Photronics, Glen Scheid from Micron, and Harry Levinson of HJL Lithography debate the results of the 2023 Luminaries Survey with Aki Fujimura of D2S as moderator.
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eBeam Industry News

Semiconductor Engineering: Center For Deep Learning In Electronics Manufacturing: Bringing Deep Learning To Production For Photomask Manufacturing [November 16, 2023]
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Semiconductor Engineering: Why Curvy Design Now? Less Change Than You Think And Manufacturable Today [October 19, 2023]
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Semiconductor Engineering: Big Changes Ahead For Photomask Technology [October 19, 2023]
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Semiconductor Digest: eBeam Initiative Survey Reports Semiconductor Industry Luminaries Are Confident in High-NA EUV and Curvilinear Photomasks [October 4, 2023]
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Semiconductor Engineering: High-NA EUV Progress and Problems: Video interview with Harry Levinson, HJL Lithography [August 22, 2023]
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Semiconductor Engineering: High-NA Lithography Starting To Take Shape [July 25, 2023]
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Semiconductor Engineering: Multi-Beam Writers are Driving EUV Mask Development – Highlights from EMLC 2023 [July 25, 2023]
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