Features

Survey: eBeam Initiative Luminaries Survey Results [October 3, 2023]
>> View

Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
>> View

Press: eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks [October 3, 2023]
>> View

Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023
>> RSVP

Presentation: DAC 2023 - Why is Curvy Design an Opportunity Now? Panel Slides [July 11, 2023]
>> View

Video: Summer 2023 Fine Line Video Journal [June 13, 2023]
>> View

Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
>> View

Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
>> View

Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
>> View

Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
>> View

Presentation: eBeam Inspection and Metrology: Developments and Applications in Lithography by Yu Cao, ASML, eBeam Initiative lunch [February 28, 2023]
>> View

Press: EUV TECH and IBM Join the eBeam Initiative [February 28, 2023]
>> English, Japanese, Simplified Chinese & Traditional Chinese

Survey: 2023 Deep Learning Applications List by eBeam Initiative members [February 28, 2023]
>> View



>>View Features Archive

About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Read the story of the eBeam Initiative


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Matt Hettermann of EUV Tech provides an inside look at the company and its EUV mask metrology.


Aki Fujimura of D2S meets up with Donis Flagello of Nikon Research Corporation of America to discuss his career and the “Cambrian explosion” of new technologies.


Tom Cecil of Synopsys discusses his extensive career in ILT with Aki Fujimura and how Synopsys is leveraging AI pervasively.


Dr. Yu Cao of ASML explains why eBeam inspection and metrology are needed, highlighting new eBeam developments at ASML.


Follow Us On:

eBeam Industry News

Semiconductor Engineering: High-NA EUV Progress and Problems: Video interview with Harry Levinson, HJL Lithography [August 22, 2023]
>> View

Semiconductor Engineering: High-NA Lithography Starting To Take Shape [July 25, 2023]
>> View

Semiconductor Engineering: Multi-Beam Writers are Driving EUV Mask Development – Highlights from EMLC 2023 [July 25, 2023]
>> View

Silicon Semiconductor: eBeam Initiative: A voice for the photomask industry during rapid evolution [June 23, 2023]
>> View

AnandTech: Intel Sells a 20% Stake in Maker of Multi E-Beam Mask Writing Tools [June 22, 2023]
>> View

Semiconductor Engineering: 193i Lithography Takes Center Stage…Again [June 15, 2023]
>> View

Semiconductor Engineering: Reflections on PMJ 2023: Embracing the Era of Curvilinear Masks by Seiji Nagahara of TEL [May 18, 2023]
>> View


>>View News Archive

View our Privacy Policy

Copyright © 2023 D2S, Inc. All Rights Reserved. For exclusive use with the eBeam Initiative.