Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
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Survey:
2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
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Survey:
eBeam Initiative Perceptions Survey Results [September 17, 2019]
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Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
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Press:
eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
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Japanese,
Simplified Chinese,
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Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 17, 2019
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Video: Summer 2019 Edition of the Fine Line Video Journal [June 5, 2019]
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Video: Spring 2019 Edition of the Fine Line Video Journal [March 26, 2019]
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Presentation: The need for speed: Computations for EUV Lithography by Harry Levinson, HJL Lithography, at SPIE eBeam lunch [February 26, 2019]
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Presentation: How GPU-Accelerated Simulation Enables Applied Deep Learning for Photomasks by Leo Pang, D2S, at SPIE eBeam lunch [February 26, 2019]
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Presentation: Applications of Machine Learning in Computational Lithography by Yu Cao, ASML, at SPIE eBeam lunch [February 26. 2019]
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
Semiconductor Engineering: Multi-Patterning EUV Vs. High-NA EUV [December 4, 2019]
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Semiconductor Engineering: Making and Protecting Advanced Masks [November 27. 2019]
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Semiconductor Engineering: Inspecting, patterning EUV masks [November 6, 2019]
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VLSI Research: Dan Hutcheson’s video interview with Aki Fujimura about the annual eBeam Initiative surveys [Nov 1, 2019]
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Semiconductor Engineering: Mask Making Issues with EUV [October 17, 2019]
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Semiconductor Engineering: Why Inverse Lithography Technology has Finally Come of Age [October 17, 2019]
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Multibeamcorp.com: Multibeam Unveils Anti-Counterfeit IC Initiative [October 8, 2019]
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