Features

Event: eBeam Initiative Annual Lunch and Members Meeting at SPIE 2019, San Jose Hilton, Tuesday, February 26, 2019
>> RSVP

Video: Autumn 2018 Edition of the Fine Line Video Journal, October 16, 2018
>> View

Survey: 2018 eBeam Initiative Mask Maker Survey Results [September 18, 2018]
>> View

Survey: 2018 eBeam Initiative Perceptions Survey Results [September 18, 2018]
>> View

Presentation: Renew, Retire, Replace by Franklin Kalk, Toppan Photomasks, at BACUS eBeam Reception [September 18, 2018]
>> View

Press: eBeam Initiative Surveys Report 27 Percent Growth in Photomasks Delivered and Continued Confidence in EUV Lithography; TEL Joins the eBeam Initiative, September 17, 2018
>> English, Japanese, Simplified Chinese, & Traditional Chinese


Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 18 with Drinks reception at 5:45pm and program at 6:30pm
>> RSVP

Event: EMLC 2018 - presentations by various eBeam Initiative members June 18-20, Grenoble, France
>> View

Event: The Litho Workshop - presentations by eBeam Initiative members June 17-21, Sun Valley, Idaho, USA
>> View

Video: Summer 2018 Edition of the Fine Line Video Journal, June 7, 2018
>> View



>>View Features Archive

About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Jan Willis sits down with Ajay Baranwal, director for the new Center for Deep Learning in Electronics Manufacturing (CDLe)


Franklin Kalk of Toppan Photomasks examines the state of photomask manufacturing


Aki Fujimura, CEO of D2S, highlights key takeaways from this year’s SPIE Photomask Technology and EUV Lithography Conference; also in Japanese


Leo Pang of D2S recaps the conference and survey results in Chinese


Follow Us On:

eBeam Industry News

Semiconductor Engineering: Multi-Beam Mask Writing Finally Comes Of Age [November 15, 2018]
>> View

Semiconductor Engineering: EUV Mask Blank Battle Brewing [November 15, 2018]
>> View

Semiconductor Engineering: Wanted - Mask Equipment For Mature Nodes [October 18, 2018]
>> View

weVISION: Dan Hutcheson’s video interview with Aki Fujimura about the annual eBeam Initiative surveys [October 16, 2018]
>> View

EE Time: Photomask Optimism Burns Bright [October 3, 2018]
>> View

Semiconductor Engineering: EUV Pellicle, Uptime and Resist Issues Continue [September 26, 2018]
>> View

Semiconductor Engineering: Survey - EUV Optimism Grows [September 17, 2018]
>> View


>>View News Archive

View our Privacy Policy

Copyright © 2018 D2S, Inc. All Rights Reserved. For exclusive use with the eBeam Initiative.