The eBeam Initiative

Features

Videos: Winter 2023 Fine Line Video Journal [January 10, 2023]
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Videos: Autumn 2022 Fine Line Video Journal [November 1, 2022]
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Presentation: O(p): GPUs, Pixels, DL, Curvy Masks & Designs by Aki Fujimura, D2S, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear Masks in Memory for DUV and EUV by Ezequiel Russell, Micron, eBeam Initiative Reception [September 27, 2022]
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Presentation: Curvilinear MPC in Zero Time by Noriaki Nakayamada, NuFlare, eBeam Initiative Reception [September 27, 2022]
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Survey: 2022 eBeam Initiative Luminaries Survey Results [September 27, 2022]
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Press: eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth [September 27, 2022]
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Event: eBeam Initiative reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:00-7:30pm Sept. 27, 2022
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Videos: Summer 2022 Fine Line Video Journal [June 28, 2022]
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Videos: Spring 2022 Fine Line Video Journal [April 19, 2022]
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Event: Replay of video - eBeam Initiative 14th Annual (Virtual) Event with Aki Fujimura of D2S, Donis Flagello of Nikon, Chris Mack of Fractilia, Harry Levinson of HJL Lithography, and Mike Hermes of Micron [March 1, 2022]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura puts on his D2S hat to explain the advantages of pixel-based computing with GPU acceleration.	Abhishek Shendre of D2S presents the Best Paper awarded at SPIE Photomask 2022.
Jan Willis, co-founder of the eBeam Initiative, recaps the results of the 11th annual Luminaries Survey.	Aki Fujimura, CEO of D2S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.
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eBeam Industry News

BACUS News: Editorial – Thomas Scherübl, Carl Zeiss SMT GmbH, on best mask size for High-NA EUV; Featured Article – 2022 BACUS Best Paper by D2S [January 7, 2023]
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SPIE: BACUS December webinar now online (login required) – “Carbon Nanotube Pellicles for EUV Lithography: Form, Function, and Progress” presented by Emily Gallagher of imec [January 7, 2023]
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SPIE: eBeam Initiative members Recognized as SPIE Fellows [January 5, 2023]
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Semiconductor Engineering: Multi-beam Mask Writers are a Game Changer [December 22, 2022]
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Semiconductor Engineering: High-NA EUV Complicates EUV Photomask Future [November 17, 2022]
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Semiconductor Engineering: Video: Why changes in computing are driving changes in photomasks
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Semiconductor Engineering: 2022 Survey: Luminaries report positive EUV impact on mask trends
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