Features

Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
>> English, Japanese, Simplified Chinese, & Traditional Chinese

Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
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Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020
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Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
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Survey: 2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
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Survey: eBeam Initiative Perceptions Survey Results [September 17, 2019]
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Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
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Press: eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
>> English, Japanese, Simplified Chinese, & Traditional Chinese




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eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura of D2S with SPIE AL 2020 highlights, including EUV, Deep Learning, curvilinear masks; also in Japanese


Ezequiel Russell of Micron, the newest member of the eBeam Initiative, answers the questions “Why curvilinear masks? Why now?”


Leo Pang of D2S also recaps SPIE-AL 2020 developments in Chinese


Thomas Kurian of Mycronic describes his company's new laser-based multi-beam photomask writers as well as his deep learning work at CDLe.


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eBeam Industry News

Semiconductor Engineering: What Machine Learning Can Do in Fabs [March 25, 2020]
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Semiconductor Digest: Micron joins the eBeam Initiative [February 25, 2020]
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Semiconductor Engineering: Multi-Patterning EUV Vs. High-NA EUV [December 4, 2019]
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Semiconductor Engineering: Making and Protecting Advanced Masks [November 27. 2019]
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Semiconductor Engineering: Inspecting, patterning EUV masks [November 6, 2019]
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VLSI Research: Dan Hutcheson’s video interview with Aki Fujimura about the annual eBeam Initiative surveys [Nov 1, 2019]
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Semiconductor Engineering: Mask Making Issues with EUV [October 17, 2019]
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