The eBeam Initiative

Features

Survey: eBeam Initiative Luminaries Survey Results [October 3, 2023]
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Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
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Press: eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks [October 3, 2023]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023
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Presentation: DAC 2023 - Why is Curvy Design an Opportunity Now? Panel Slides [July 11, 2023]
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Video: Summer 2023 Fine Line Video Journal [June 13, 2023]
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Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
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Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
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Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
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Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
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Presentation: eBeam Inspection and Metrology: Developments and Applications in Lithography by Yu Cao, ASML, eBeam Initiative lunch [February 28, 2023]
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Press: EUV TECH and IBM Join the eBeam Initiative [February 28, 2023]
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Survey: 2023 Deep Learning Applications List by eBeam Initiative members [February 28, 2023]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Matt Hettermann of EUV Tech provides an inside look at the company and its EUV mask metrology.	Aki Fujimura of D2S meets up with Donis Flagello of Nikon Research Corporation of America to discuss his career and the “Cambrian explosion” of new technologies.
Tom Cecil of Synopsys discusses his extensive career in ILT with Aki Fujimura and how Synopsys is leveraging AI pervasively.	Dr. Yu Cao of ASML explains why eBeam inspection and metrology are needed, highlighting new eBeam developments at ASML.
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eBeam Industry News

Semiconductor Engineering: High-NA EUV Progress and Problems: Video interview with Harry Levinson, HJL Lithography [August 22, 2023]
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Semiconductor Engineering: High-NA Lithography Starting To Take Shape [July 25, 2023]
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Semiconductor Engineering: Multi-Beam Writers are Driving EUV Mask Development – Highlights from EMLC 2023 [July 25, 2023]
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Silicon Semiconductor: eBeam Initiative: A voice for the photomask industry during rapid evolution [June 23, 2023]
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AnandTech: Intel Sells a 20% Stake in Maker of Multi E-Beam Mask Writing Tools [June 22, 2023]
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Semiconductor Engineering: 193i Lithography Takes Center Stage…Again [June 15, 2023]
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Semiconductor Engineering: Reflections on PMJ 2023: Embracing the Era of Curvilinear Masks by Seiji Nagahara of TEL [May 18, 2023]
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