Features

Videos: Spring 2022 Fine Line Video Journal [April 19, 2022]
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Event: Replay of video - eBeam Initiative 14th Annual (Virtual) Event with Aki Fujimura of D2S, Donis Flagello of Nikon, Chris Mack of Fractilia, Harry Levinson of HJL Lithography, and Mike Hermes of Micron [March 1, 2022]
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Press: Scanning Electron Microscopy Takes the Spotlight in Annual Deep Learning Survey by the eBeam Initiative - ESOL, Fractilia and HJL Lithography Join the eBeam Initiative [March 1, 2022]
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Survey: 2022 Deep Learning Applications List by eBeam Initiative members [March 1, 2022]
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Videos: Autumn 2021 Fine Line Video Journal [October 26, 2021]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]

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>> Entire event (1h 22m)
>> Luminaries survey results (14m)
>> Mask revenues (12m)
>> EUV mask (21m)
>> Mask writers (12m)
>> Deep Learning (DL) (10m)
>> Curvilinear masks (6m)

Survey: 2021 eBeam Initiative Luminaries Survey Results [September 28, 2021]
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Press: eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
>> English, Japanese Simplified Chinese & Traditional Chinese

Event: eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
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Video: Summer 2021 Fine Line Video Journal [June 22, 2021]
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Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura, CEO of D2S, interviews Mike Hermes, vice president of mask technology at Micron, about the changing landscape in mask making, including the shift to multi-beam mask writing and curvilinear masks.


Dr. Harry J. Levinson comments on winning the 2022 SPIE Frits Zernike Award and shares his experiences in lithography and what to expect in the future.


Leo Pang of D2S provides an overview of the evolution of ILT from his SPIE JM3 ILT review paper published in 2021.


Aki Fujimura explains why curvilinear mask shapes are important for both photomask and wafer manufacturers.


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eBeam Industry News

Semiconductor Engineering: Photomask Shortages Grow At Mature Nodes [April 21, 2022]
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Semiconductor Engineering: Curvilinear Photomasks Can Be Made Today [April 21, 2022]
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Electronic Times Korea: ESOL Joins the eBeam Initiative [March 9, 2022]
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Semiconductor Engineering: Unsolved Issues in Next Gen Photomasks [February 17, 2022]
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Semiconductor Engineering: The Right Project is Key for Photomask Adoption of Deep Learning [February 17, 2022]
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Semiconductor Engineering: Photomask Challenges at 3nm and Beyond [January 25, 2022]
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Semiconductor Engineering: Luminaries See Growth Opportunities for Photomask Writers [January 20, 2022]
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