The eBeam Initiative

Features

Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
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Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
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Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
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Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
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Presentation: eBeam Inspection and Metrology: Developments and Applications in Lithography by Yu Cao, ASML, eBeam Initiative lunch [February 28, 2023]
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Press: EUV TECH and IBM Join the eBeam Initiative [February 28, 2023]
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Survey: 2023 Deep Learning Applications List by eBeam Initiative members [February 28, 2023]
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Videos: Winter 2023 Fine Line Video Journal [January 10, 2023]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Dr. Yu Cao of ASML explains why eBeam inspection and metrology are needed, highlighting new eBeam developments at ASML.	Dr. David Lam of Multibeam Corp. describes the misperceptions and opportunities for eBeam lithography.
Dr. Harry Levinson of HJL Lithography reflects on developments he observed at SPIE Advanced Litho + Patterning.	Aki Fujimura, CEO of D2S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.
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eBeam Industry News

Semiconductor Engineering: Reflections on PMJ 2023: Embracing the Era of Curvilinear Masks by Seiji Nagahara of TEL [May 18, 2023]
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Semiconductor Engineering: How Curvilinear Mask Writing Affects Chip Design - Video [April 12, 2023]
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Semiconductor Engineering: Evolution of the EUV Ecosystem Reflected at 2023 Advanced Lithography Patterning [March 16, 2023]
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Semiconductor Digest: EUV Tech and IBM Join the eBeam Initiative [March 1, 2023]
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Semiconductor Engineering: Mapping the Future of Lithography [February 16, 2023]
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BACUS News: Editorial – Thomas Scherübl, Carl Zeiss SMT GmbH, on best mask size for High-NA EUV; Featured Article – 2022 BACUS Best Paper by D2S [January 7, 2023]
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SPIE: BACUS December webinar now online (login required) – “Carbon Nanotube Pellicles for EUV Lithography: Form, Function, and Progress” presented by Emily Gallagher of imec [January 7, 2023]
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