Features

Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
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Survey: 2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
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Survey: eBeam Initiative Perceptions Survey Results [September 17, 2019]
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Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
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Press: eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
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Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 17, 2019
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Video: Summer 2019 Edition of the Fine Line Video Journal [June 5, 2019]
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Video: Spring 2019 Edition of the Fine Line Video Journal [March 26, 2019]
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Presentation: The need for speed: Computations for EUV Lithography by Harry Levinson, HJL Lithography, at SPIE eBeam lunch [February 26, 2019]
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Presentation: How GPU-Accelerated Simulation Enables Applied Deep Learning for Photomasks by Leo Pang, D2S, at SPIE eBeam lunch [February 26, 2019]
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Presentation: Applications of Machine Learning in Computational Lithography by Yu Cao, ASML, at SPIE eBeam lunch [February 26. 2019]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Dr. Leo Pang of D2S explains the importance of ILT digital twins in today’s growing curvilinear ILT world


Ajay Baranwal, Center for Deep Learning in Electronics Manufacturing (CDLe), describes five deep learning recipes for the semiconductor mask making industry


Jan Willis recaps key findings from this year’s annual eBeam Initiative Perceptions survey


Aki Fujimura, CEO of D2S, provides key takeaways from the recent Photomask Technology Conference; also in Japanese


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eBeam Industry News

Semiconductor Engineering: Inspecting, patterning EUV masks [November 6, 2019]
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VLSI Research: Dan Hutcheson’s video interview with Aki Fujimura about the annual eBeam Initiative surveys [Nov 1, 2019]
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Semiconductor Engineering: Mask Making Issues with EUV [October 17, 2019]
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Semiconductor Engineering: Why Inverse Lithography Technology has Finally Come of Age [October 17, 2019]
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Multibeamcorp.com: Multibeam Unveils Anti-Counterfeit IC Initiative [October 8, 2019]
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IEEE Spectrum: Custom Computer Makes ILT Practical for First Time, Samuel Moore [September 25, 2019]
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Semiconductor Engineering: Mixed Picture Seen for EUV Masks [September 16, 2019]
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