Features

Event: Replay of video - eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
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>> Entire event (1h 22m)
>> Luminaries survey results (14m)
>> Mask revenues (12m)
>> EUV mask (21m)
>> Mask writers (12m)
>> Deep Learning (DL) (10m)
>> Curvilinear masks (6m)

Survey: 2021 eBeam Initiative Luminaries Survey Results [September 28, 2021]
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Press: eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
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Event: eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
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Video: Summer 2021 Fine Line Video Journal [June 22, 2021]
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Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
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Video: Spring 2021 Fine Line Video Journal [March 23, 2021]
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Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
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Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
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Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
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Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
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Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
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Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
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Press: eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
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Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
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Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
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Press: Micron Joins the eBeam Initiative [February 25, 2020]
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura of D2S interviews Vivek Singh about his new role as VP, Advanced Technology Group at NVIDIA


Thomas Cecil of Synopsys explains the benefits of curvilinear ILT mask synthesis.


Peter Buck of Siemens Digital Industries Software makes the case for a new standard for curvilinear data.


Leo Pang of D2S recaps in Chinese a joint paper with Micron Technology on enabling faster VSB writing of 193i curvilinear ILT masks. Also in English.


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eBeam Industry News

Semiconductor Digest: Applied Materials Unveils eBeam Metrology System that Enables a New Playbook for Patterning Advanced Logic and Memory Chips [October 19, 2021]
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Semiconductor Digest: eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
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SPIE Journal of Micro/Nanopatterning, Materials, Metrology: Inverse lithography technology: 30 years from concept to practical, full-chip reality by Leo Pang, D2S [August 31, 2021]
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Semiconductor Engineering: Optimizing VSB Shot Count for Curvilinear Masks [August 19, 2021]
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Semiconductor Engineering: What About Mask Rule Checking for Curvilinear Photomasks? [July 22, 2021]
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Semiconductor Engineering: Finding, Predicting EUV Stochastic Defects [June 17, 2021]
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Semiconductor Engineering: Developing a New Curvilinear Data Format [June 17, 2021]
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