Videos Archive




Ryan Pearman of D2S reviews the challenges of mask modeling in the EUV era in part 2 of a series, part 1 on mask modeling in the multi-beam era can be viewed here


Jim Wiley, president of SPIE BACUS, talks about this year’s merger of the EUV Lithography Symposium and the SPIE Photomask Conference as well as his predictions on machine learning


Aki Fujimura, CEO of D2S, highlights the company’s latest developments as it celebrates its 10th anniversary, as well as recaps hot topics at Photomask Japan such as deep learning, pixel-level dose correction, and the state of EUV, multi-beam NIL; also in Japanese


Leo Pang, chief product officer of D2S, also recaps these developments in Chinese


Tom Cecil of Synopsys discusses the resurgence of inverse lithography technology (ILT), including future opportunities for supporting directed self-assembly (DSA) and EUV


Greg McIntyre of imec offers his thoughts on what’s driving up confidence in EUV and the latest on imec’s joint venture with JSR in EUV resist development


Aki Fujimura, CEO of D2S, looks back at SPIE-AL and forward to PMJ 2017; also in Japanese


Leo Pang, chief product officer of D2S, also recaps these developments, including CSTIC, in Chinese


Dr. David Lam, Chairman of Multibeam Corp., explains how eBeam technology can create the foundation for a more secure connected world


eBeam industry luminary Brian Grenon offers an analysis of the results of the eBeam Initiative’s 2016 Mask Maker survey


Aki Fujimura, CEO of D2S, highlights several key developments at BACUS 2016; also in Japanese


Leo Pang, chief product officer of D2S, also recaps these developments in Chinese


Aki Fujimura shares his viewpoint on how all lithography paths lead to multi-beam mask writing


Naoya Hayashi of DNP examines both challenges and progress with nanoimprint lithography (NIL) master templates


Aki Fujimura, CEO of D2S, recaps the emerging lithography trends presented at Photomask Japan and the agenda for the upcoming eBeam Initiative Taiwan seminar in June


Leo Pang, chief product officer of D2S, also reviews these developments—in Chinese—including highlights of the recent China Semiconductor Technology International Conference


Dr. Hiroshi Matsumoto of NuFlare Technology introduces his company’s new multi-beam mask writer, the MBM-1000, along with resolution performance results from an alpha version of the tool


Doug Resnick of Canon Nanotechnologies -- one of the eBeam Initiative’s newest members--provides an insider’s look at nanoimprint lithography (NIL)


Aki Fujimura, CEO of D2S, recaps the buzz at the eBeam Initiative luncheon at the SPIE Advanced Lithography Conference


In a new addition to the Fine Line, Leo Pang, chief product officer of D2S, recaps the SPIE and eBeam Initiative highlights in Chinese


Brian Grenon of RAVE and Klaus Edinger of ZEISS join Aki Fujimura in breaking down the results of the latest eBeam Initiative surveys during a luminary panel discussion at the eBeam Initiative reception at BACUS


The Fine Line welcomes Markus Waiblinger of new eBeam Initiative member ZEISS, who explains how low-energy eBeam technology represents a paradigm shift in photomask repair and helps enable Moore’s Law


Industry luminary Dr. David Lam of Multibeam Corporation provides an update on complementary eBeam lithography (CEBL)


Aki Fujimura, CEO of D2S, recaps the breaking news and emerging trends that came out of the recently concluded SPIE Photomask BACUS conference, as well as describes what surprised him most about the results of the eBeam Initiative surveys


Shot Talk catches up with Aki Fujimura, CEO of D2S, who shares his takeaways from the recent Photomask Japan conference


Noriaki Nakayamada of NuFlare describes ways to conquer resist heating effects in VSB mask writing along with a glimpse into multi-beam mask writing


Takayuki Nakamura of Advantest brings mask defects at the 1X node into focus with an overview of new 2D- and 3D-based mask defect verification methodologies


Shot Talk catches up with Aki Fujimura, CEO of D2S, who shares his thoughts on the key themes and hot topics at SPIE 2015


Colin Harris, COO of PMC-Sierra, shares his perspective on why Moore’s law worked at 16nm and the challenge of repeating that at 10nm


Industry luminaries Tom Faure, Bob Pack, Noriaki Nakayamada and Aki Fujimura analyze the mask industry’s responses to the 2014 eBeam Initiative survey


Shot Talk catches up with Aki Fujimura, CEO of D2S, who shares his thoughts on the key themes and hot topics at BACUS


Bob Pack of GLOBALFOUNDRIES describes a potential flow for integrated mask/lithography signoff verification to address mask hotspots


Aki Fujimura explains how context-dependent mask effects require simulation-based MDP; also in Japanese


Kang-Hoon Choi of Fraunhofer CNT explores the capabilities, limitations and requirements of corner rounding correction in mask data


Aki Fujimura welcomes Dr. Leo Pang to D2S


Dr. David Lam, chairman of Multibeam Corp., “Can eBeam lithography ever get into mainstream manufacturing?”


Tony Luo, founder of Maglen and the newest member of the eBeam Initiative, introduces multi-column eBeam inspection


Dr. Sergey Babin, founder and president of aBeam Technologies, on charging effects and mask hotspots


Mark Sheppard from Advantest describes emerging trends in mask metrology


Aki Fujimura from D2S reviews
SPIE and looks ahead at PMJ


Aki Fujimura explains the mask hotspots trend; also in Japanese


Naoya Hayashi of DNP looks at mask trends and reports MB-MDP results


Aki Fujimura, D2S, Fine Line Winter 2013


Hugh Durdan, Xilinx, Fine Line Winter 2013


Samsung and D2S, Fine Line Winter 2013


Ryan Pearman, D2S, Fine Line Winter 2013


Sergey Babin, aBeam Technologies, BACUS 2012


Brian Grenon, Advanced Technical Instruments,
BACUS 2012


Aki Fujimura, D2S, BACUS 2012


Michael Smayling, Tela Innovations, SPIE 2012


Ryan Pearman, D2S, SPIE 2012


David Lam, Multibeam Corporation, SPIE 2012


Aki Fujimura, D2S, SPIE 2012


Christian Bϋrgel, AMTC, BACUS 2011


Naoya Hayashi, DNP, BACUS 2011


Aki Fujimura, D2S, BACUS 2011


Gek Soon Chua, GLOBALFOUNDRIES, BACUS 2011


Franklin Kalk, Toppan Photomasks, BACUS 2011



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