eBeam Education

Presentations and Papers:

  • Survey: 2017 eBeam Initiative Mask Maker Survey Results [September 11, 2017]
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  • Survey: eBeam Initiative Perceptions Survey Results [September 11, 2017]
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  • Presentation: What’s Different about EUV Masks? by Tom Faure from GLOBALFOUNDRIES, presented at eBeam Initiative “BACUS” Reception [September 11, 2017]
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  • Presentation: The Resurgence of ILT by Tom Cecil, Synopsys, presented at eBeam Initiative SPIE 2017 Lunch [February 28, 2017]
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  • Presentation: Mask Modeling in the Multi-beam Era by Ryan Pearman, D2S, presented at eBeam Initiative SPIE 2017 Lunch [February 28, 2017]
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  • Presentation: eBeam at Light Speed for the EPE Metrology Era by Ofer Adan, Applied Materials, presented at eBeam Initiative SPIE 2017 Lunch [February 28, 2017]
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  • Survey: 2016 eBeam Initiative Mask Maker Survey Results [September 12, 2016]
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  • Survey: 2016 eBeam Initiative Perceptions Survey Results [September 12, 2016]
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  • White paper: GPU-Accelerated Computing: Maximizing Performance for the 24/7 Semiconductor Manufacturing Environment by Aki Fujimura, D2S [September 12, 2016]
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  • Presentation: Embedding IoT Chip Security using eBeam Solutions by Dr. David Lam, Multibeam Corporation [September 12, 2016]
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  • Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at Taiwan Seminar on June 22, 2016
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  • Maglen eBeam Wafer Imaging System by Tony Luo, Maglen at Taiwan Seminar on June 22, 2016
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  • The Latest Progress in Model-based Mask Data Prep by Leo Pang, D2S at Taiwan Seminar on June 22, 2016
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  • The Latest Progress in Model-Based Mask Data Preparation by Leo Pang, D2S at CSTIC on March 13, 2016
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  • Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at SPIE on February 23, 2016
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  • 5nm Test Chip Design & Manufacturing Challenges by Praveen Raghavan, imec at SPIE on February 23, 2016
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  • The Challenges in Making NIL Master Templates by Naoya Hayashi, DNP at SPIE on February 23, 2016
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  • Recent Progress of Electron Multi-Beam Mask Writer by Elmar Platzgummer, IMS at BACUS on September 29, 2015
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  • Mask Metrology in the ILT World by Leo Pang, D2S at BACUS on September 29, 2015
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  • 2015 eBeam Initiative Perceptions Survey and Mask Makers Survey, September 29, 2015
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  • SEMICON Taiwan – Removing the Last Road Block of Deploying ILT into 10nm by Dr. Leo Pang, D2S, September 3, 2015
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  • Presentation: Conquering Heat Issues in Electron Beam Lithography – Past, Present and the Future by Noriaki Nakayamada of NuFlare Technology at PMJ Workshop [April 20, 2015]
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  • Presentation: Electron Beam-based Photomask Repair by Markus Waiblinger of Carl Zeiss, at PMJ Workshop on [April 20, 2015]
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  • Presentation: Simulation-based Mask Inspection and Review for the 10nm Node and Beyond by Leo Pang of D2S, at PMJ Workshop on [April 20, 2015]
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  • Presentation: Reactivating the Density Benefits of Moore’s Law - the eBeam Community Gears Up by Aki Fujimura, D2S [February 24, 2015]
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  • Presentation: Wafer Plane Analysis of Mask SEM in 2D & 3D by Takayuki Nakamura, Advantest [February 24, 2015]
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  • Presentation: Mask Maker’s Perspective on 10-nm Node by Chris Progler, Photronics [February 24, 2015]
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  • Paper: Fabrication of patterns with linewidths down to 1.5 nm by Dr. Sergey Babin – aBeam Technologies, Dr. Valeriy Yashchuk - LBNL, Dr. Ray Conley – Argonne National Laboratory [February 3, 2015]
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  • Survey: 2014 eBeam Initiative survey results [September 16, 2014]
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  • Presentation: Integrated Mask/Litho Signoff Verification using a Virtual VSB Writer by Bob Pack, GLOBALFOUNDRIES [September 16, 2014]
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  • Presentation: Impact of Context-Dependent Mask-Effects on Mask Hotspots by Aki Fujimura, D2S [September 16, 2014]
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  • White Paper: Mask Hotspots Are Escaping the Mask Shop; Model-Based Mask Verification Can Stop Them, [February 25, 2014]
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  • 2014 SPIE eBeam Initiative lunch presentations by D2S, DNP and Mentor Graphics, [February 25, 2014]
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  • BACUS 2013 eBeam Initiative event presentation by Dr. John Chen, NVIDIA [September 10, 2013]
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  • BACUS 2013 eBeam Initiative event presentation by Dr. Kokoro Kato, Hitachi High-Tech Science Corp [September 10, 2013]
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  • eBeam Initiative 2013 survey results [September 10, 2013]
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  • Survey Results presented during Photomask Japan 2013 panel - Future Mask Patterning Technologies in the Next Decade
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  • Photomask Japan 2013 panel presentation on challenges for future eBeam mask writers by Dr. Hiroshi Matsumoto, NuFlare.
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  • Photomask Japan 2013 panel presentation on multi-beam by Dr. Hans Loeschner, IMS Nanofabrication
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  • Photomask Japan 2013 panel presentation on eBeam simulation by Aki Fujimura, D2S
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  • SPIE 2013 eBeam Initiative lunch presentations by D2S, Xilinx and Toshiba [February 26, 2013]
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  • eBeam Initiative 2012 survey results, Jan Willis, eBeam Initiative [September 11, 2012]
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  • Printing results from a multi-beam mask exposure tool Elmar Platzgummer, IMS Nanofabrication [September 11, 2012]
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  • Improving mask CDU using MB-MDP at 14nm and beyond, Byung-Gook Kim, Samsung [September 11, 2012]
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  • Full-Chip MB-MDP is here, Aki Fujimura, D2S [September 11, 2012]
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  • HOYA, GLOBALFOUNDRIES and D2S presentations at eBeam Initiative Luncheon during PMJ2012 [April 19, 2012]
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  • PMJ 2012 Results of Proof-of-Concept 50keV electron multi-beam Mask Exposure Tool (eMET POC) by Elmar Platzgummer, Christof Klein, and Hans Loeschner, IMS Nanofabrication [April 2012]
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  • Computational Lithography Requirements & Challenges for Mask Making by Naoya Hayashi, DNP Printing Co., Ltd, presented at the LithoVision technical symposium [February 2012]
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  • eBeam Initiative SPIE 2012 presentations by D2S, Tela Innovations in collaboration with CEA-Leti [February 14, 2012]
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  • MB-MDP Enables Circular Shots to Improve Mask Accuracy as Well as Shot Count by Ryan Pearman and Robert Pack - D2S, Inc. [February 13, 2012]
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  • SPIE 2012 50keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC), Christof Klein, Hans Loeschner, Elmar Platzgummer, IMS Nanofabrication, Proc. SPIE 8323,83230G [February 2012]
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  • eBeam Initiative BACUS event presentations by AMTC, D2S and GLOBALFOUNDRIES, including Best Poster presentation by Dr. Gek Soon Chua, GLOBALFOUNDRIES [September 20, 2011]
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  • BACUS 2011 Paper - Reducing shot count through optimization-based fracture, Timothy Lin, Emile Sahouria, Nataraj Akkiraju, and Steffen Schulze. Proc. SPIE 8166, 81660T (2011) [October 13, 2011]
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  • BACUS 2011 Poster Session - Assessment and comparison of different approaches for mask write time reduction, A. Elayat, T. Lin, E. Sahouria, and S. F. Schulze, Proc. SPIE 8166, 816634 (2011) [October 13, 2011]
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  • BACUS 2011 Best Poster - Optimization of mask shot count using MB-MDP and lithography simulation by GLOBALFOUNDRIES and D2S [September 20, 2011]
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  • SPIE 2011 Model-Based Mask Data Prep (MB-MDP) and its effect on heating [March 2, 2011]
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  • IBM presentation at eBeam Initiative SPIE lunch [March 1, 2011]
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  • NuFlare presentation at eBeam Initiative SPIE Lunch [March 1, 2011]
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  • D2S presentation at eBeam Initiative SPIE Lunch [March 1, 2011]
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  • SPIE 2011 E-beam Direct Write Overview [March 1, 2011]
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  • SPIE 2011 IMAGINE: An Open Consortium to Boost Maskless Lithography Take Off - First Assessment Results on Mapper Technology [March 2011]
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  • Model-Based Mask Data Preparation Using Overlapping Shots: Making Optical Lithography Cost-effective for 20-nm Devices [March 1, 2011]
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  • Improvement of Mask Write Time for Curvilinear Assist Features at 22nm [September 14, 2010]
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  • Writing 32nm-hp Contacts with Curvilinear Assist Features [September 14, 2010]
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  • Impact of Model-Based Fracturing on E-beam Proximity Effect Correction Methodology [September 14, 2010]
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  • Design for e-beam: design insights for direct-write maskless lithography [September 15, 2010]
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  • Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, David Kim, Vikram Tolani and Tom Cecil - Luminescent Technologies; Photomask Japan 2010
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  • Efficiently writing circular contacts on production reticle; Aki Fujimura - D2S, Christophe Pierrat - IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa - JEOL; Photomask Japan 2010
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  • Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count Harold R. Zable and Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen - Petersen Advanced Lithography; Photomask Japan 2010
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  • ISQED Keynote now available - Design for E-Beam: Getting the Best Wafers Without the Exploding Mask Costs by Aki Fujimura, March 24, 2010
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  • Circles: One Key to Successful Lithography at Advanced Nodes by Aki Fujimura, February 23, 2010
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  • DFEB Methodology Guidelines for Physical Design Engineers now available
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  • ICCAD Tutorial now available - Beyond Light: The Growing Importance of E-Beam by Aki Fujimura, Nov. 2, 2009
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  • eBeam members presentation at EIPBN - May 29, 2009
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  • eBeam members presentation at MUSIC - April 2, 2009
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  • DFEB Technology Backgrounder
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  • Initiative Overview
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  • Fujitsu Viewpoint at Initiative Launch
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  • eSilicon Perspective on DFEB
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