Events: eBeam Initiative Member Papers and Posters at SPIE 2012
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Events: SPIE 2012 eBeam Initiative Luncheon for members and guests, Tuesday, February 14
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Education: BACUS 2011 Paper - Reducing shot count through optimization-based fracture, Timothy Lin, Emile Sahouria, Nataraj Akkiraju, and Steffen Schulze. Proc. SPIE 8166, 81660T (2011); October 13, 2011
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Education: BACUS 2011 Poster Session - Assessment and comparison of different approaches for mask write time reduction,
A. Elayat, T. Lin, E. Sahouria, and S. F. Schulze,
Proc. SPIE 8166, 816634 (2011);
October 13, 2011
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Education: BACUS 2011 Best Poster – Optimization of mask shot count using MB-MDP and lithography simulation, September 20, 2011
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Education: BACUS 2011 Efficient large volume data preparation for electron beam lithography for sub-45nm node
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Presentations: eBeam Initiative BACUS event presentations by AMTC, D2S and GLOBALFOUNDRIES, including Best Poster presentation by Dr. Gek Soon Chua, GLOBALFOUNDRIES, September 20, 2011
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Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies, from eBeam direct write technologies such as character projection eBeam (CpEb) and multiple eBeam (MEB) to variable-shaped beam (VSB) and MEB mask writing systems.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
Jack Harding, eSilicon Corporation
Colin Harris, PMC-Sierra
Riko Radojcic, Qualcomm
Jean-Pierre Geronimi, STMicroelectronics
eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.
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ElectroIQ: Mask-wafer double simulation: A new lithography requirement at 22nm [December 30, 2011]
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SemiMD: E-beam Costs to Soar in Multi-Patterning Era – Mark LaPedus [October 22, 2011]
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SST WaferNews: SPIE BACUS: Better 20nm litho, and where’s the EUV funding? Having your cake and eating it, too [October 11, 2011]
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SemiMD: BACUS Panel Considers Model-based Data Prep – Marc David Levenson [October 7, 2011]
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ElectroIQ: SPIE BACUS: Delayed Photomask Japan 2011 in a nutshell – Franklin Kalk [September 21, 2011]
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GSA Forum: The Lithography Gap Widens at the 20nm Logic Node: New eBeam Approaches Required to Complete the Design Chain [September 2011]
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EETimes: eBeam Initiative expands membership [September 12, 2011]
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