The eBeam Initiative

Features

Survey: 2026 eBeam Initiative Luminaries Survey Results [September 9, 2026]
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Presentation: Photomask Ecosystem – Current Status and Issues, Naoya Hayashi, DNP Honorary Fellow [September 9, 2026]
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Press: eBeam Initiative Survey Predicts a Bright Outlook for the Photomask Industry [September 9, 2026]
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Videos: Breaking news from SPIE BACUS workshop on Large Format Masks [September 7, 2026]
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Event: [Note it’s on a Wednesday] eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; Wednesday Sept. 9, 2026
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Videos: Summer 2026 Fine Line Video Journal [June 11, 2026]
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Videos: Spring 2026 Fine Line Video Journal [March 25, 2026]
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Presentation: Only Entirely Curvilinear Masks are Entirely Manufacturable Masks, Aki Fujimura, D2S [February 24, 2026]
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Survey: 2026 Deep Learning/LLM Applications List by eBeam Initiative members [February 24, 2026]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 24, 2026
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Videos: Autumn 2025 Fine Line Video Journal [November 5, 2025]
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Survey: 2025 eBeam Initiative Luminaries Survey Results [September 23, 2025]
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Presentation: Technology Analysis of Leading-Edge Semiconductor Manufacturing, Tetsuya Wadaki, Morgan Stanley MUFG [September 23, 2025]
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Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 5:00–7:15pm Sept. 23, 2025
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches based on electron beam (eBeam) technologies. The goals of the eBeam Initiative are to reduce the barriers to adoption to enable more IC design starts and faster time-to-market while increasing the investment in eBeam technologies.

Read the story of the eBeam Initiative

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Aki Fujimura, in his role as President of BACUS, provides breaking news coverage from the 12-inch Large Format Mask Workshop on September 7, 2026.	Harry Levinson of HJL Lithography provides a historical perspective on how masks became critical for the semiconductor industry while covering the evolution of lithography.
Leo Pang of D2S shares his insights on 2026 Photomask Japan (PMJ) with eBeam Initiative’s Angie Kellen.	Asmus Hetzel of D2S describes the limitations of current Gaussian models and introduces Freeform Point Spread Function (FF PSF) models as a solution for EUV (or any) masks.
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eBeam Industry News

Business Insider: ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV
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Semiecosystem: Multibeam Debuts Next-Gen E-Beam Lithography Tool by Mark LaPedus [July 23, 2026]
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Semiconductor Engineering: Mask Economics Shape High-NA EUV Adoption [June 22, 2026]
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Semiecosystem: Latest News in Lithography by Mark LaPedus [June 7, 2026]
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Semiconductor Engineering: Curvilinear Masks Push the Limits of Inspection and Metrology [May 27, 2026]
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Semiconductor Engineering: Mask Technology Faces a New Set of Challenges [May 21, 2026]
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Semiconductor Engineering: eBeam Initiative at SPIE ALP 2026 [April 16, 2026]
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