Features

Presentation: Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at Taiwan Seminar on June 22, 2016
>> Download PDF

Presentation: Maglen eBeam Wafer Imaging System by Tony Luo, Maglen at Taiwan Seminar on June 22, 2016
>> Download PDF

Presentation: The Latest Progress in Model-based Mask Data Prep by Leo Pang, D2S at Taiwan Seminar on June 22, 2016
>> Download PDF

Videos: Summer 2016 Edition of the Fine Line Video Journal, May 24, 2016
>> Download PDF

Events: Save the Date for the eBeam Initiative Taiwan Seminar 2016, Hotel Royal Hsinchu, Wednesday, June 22, 11:45am registration, buffet lunch, presentations and drinks reception ending at 5pm
>> RSVP

Events: eBeam Initiative at Photomask Japan 2016 – banquet sponsor and Aki Fujimura to present survey results
>> View

Presentation: eBeam Initiative was a sponsor at CSTIC in Shanghai, March 13-14; The Latest Progress in Model-Based Mask Data Preparation by Leo Pang
>> Download PDF

Videos: Spring 2016 Edition of the Fine Line Video Journal, March 15, 2016
>> Download PDF

Presentation: Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at SPIE on February 23, 2016
>> Download PDF

Presentation: 5nm Test Chip Design & Manufacturing Challenges by Praveen Raghavan, imec at SPIE on February 23, 2016
>> Download PDF



>>View Features Archive

About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.


Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.


eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.



Aki Fujimura shares his viewpoint on how all lithography paths lead to multi-beam mask writing


Naoya Hayashi of DNP examines both challenges and progress with nanoimprint lithography (NIL) master templates


Aki Fujimura, CEO of D2S, recaps the emerging lithography trends presented at Photomask Japan and the agenda for the upcoming eBeam Initiative Taiwan seminar in June


Leo Pang, chief product officer of D2S, also reviews these developments—in Chinese—including highlights of the recent China Semiconductor Technology International Conference


Follow Us On:

eBeam Industry News

Semiconductor Engineering: Executive Insight – Aki Fujimura [June 23, 2016]
>> View

GSA Forum: Reducing IC Manufacturing Cost While Enhancing IoT Security by Dr. David Lam [June 2016]
>> View

Semiconductor Engineering: What’s the Outlook for ICs? By Mark LaPedus [May 19, 2016]
>> View

Semiconductor Engineering: 7nm Fab Challenges by Mark LaPedus [April 21, 2016]
>> View

Semiconductor Engineering: Where is Next-Gen Lithography? – Part 3 Panel discussion [April 11, 2016]
>> View

Semiconductor Engineering: Where is Next-Gen Lithography? – Part 2 Panel discussion [March 31, 2016]
>> View

Semiconductor Engineering: GPU Based Computing in Photomask Manufacturing by Aki Fujimura, D2S [March 28, 2016]
>> View


>>View News Archive

Copyright © 2016 D2S, Inc. All Rights Reserved. For exclusive use with the eBeam Initiative.