Events: PMJ 2017 Keynote April 5: “GPU: the Biggest Key Processor for AI and Parallel Processing” Presenter: Toru Baji (NVIDIA Japan)
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Events: PMJ 2017 April 5 15:10-16:10 Session 3 Use of GPU in Mask Making (I); 16:30-18:00 Session 4 Use of GPU in Mask Making (II)
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Events: PMJ 2017 Invited Talk April 5: “eBeam Initiative Survey Reports Confidence in EUV and Multi-beam Technology” Presenter: Aki Fujimura (eBeam Initiative)
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Events: Please RSVP — eBeam Initiative Annual Lunch and Members Meeting at SPIE 2017, San Jose Hilton, Tuesday, February 28, 2017

Presentation: The Mask Industry is Ready for Curvilinear ILT by Leo Pang at the 2016 Lithography Workshop, November 10, 2016
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Videos: Autumn 2016 Edition of the Fine Line Video Journal, October 12, 2016
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Awards: Congratulations to Naoya Hayashi of DNP for receiving the Photomask Lifetime Achievement Award at BACUS 2016; read his “Meet the eBeamer” story below
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Press: eBeam Initiative Survey Reports Confidence in EUV Lithography and Multi-beam Technology for High-Volume Semiconductor and Photomask Production, September 12, 2016
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About Us

Mission | The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.

eBeam Member Videos | Proof points, viewpoints and products discussed by eBeam Initiative members.

Dr. David Lam, Chairman of Multibeam Corp., explains how eBeam technology can create the foundation for a more secure connected world

eBeam industry luminary Brian Grenon offers an analysis of the results of the eBeam Initiative’s 2016 Mask Maker survey

Aki Fujimura, CEO of D2S, highlights several key developments at BACUS 2016; also in Japanese

Leo Pang, chief product officer of D2S, also recaps these developments in Chinese

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eBeam Industry News

Semiconductor Engineering: Inside Photomask Writing [January 19, 2017]
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Semiconductor Engineering: Multi-Patterning Issues at 7nm, 5nm [November 28, 2016]
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Semiconductor Engineering: Why EUV is So Difficult [November 17, 2016]
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Semiconductor Engineering: More EUV Mask Gaps [November 17, 2016]
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Semiconductor Engineering: What Happened to Inverse Lithography? [October 20, 2016]
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Semiconductor Engineering: Will GPU-Acceleration Mean the End of Empirical Mask Models? Ryan Pearman, D2S [October 20, 2016]
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SemiMD: D2S Releases 4th-Gen IC Computational Design Platform [September 30, 2016]
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