Initiative Press Releases:

• eBeam Initiative Members Present Collaborative Results at SPIE/BACUS Photomask Symposium 2011 - Five Additional Companies Join eBeam Initiative, September 12, 2011
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• Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask - D2S Option to NuFlare EBM-700 System Enalbes Design for E-Beam (DFEB) Mask Technology , March 1, 2011
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• eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 - E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative, February 22, 2011
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• eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 - Four New Members Join eBeam Initiative, September 7, 2010
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• eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 - Three New Companies Join eBeam Initiative, April 13, 2010
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• eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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• eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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• GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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• Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
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• eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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• 20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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• Members Quote Sheet
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FAQ

• Download the eBeam FAQ (PDF)