
Initiative Press Releases:
eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 - Three New Companies Join eBeam Initiative, April 13, 2010
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eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
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eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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Members Quote Sheet
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FAQ
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Presentations and Papers:
Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, David Kim, Vikram Tolani and Tom Cecil - Luminescent Technologies; Photomask Japan 2010
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Efficiently writing circular contacts on production reticle; Aki Fujimura - D2S, Christophe Pierrat - IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa - JEOL; Photomask Japan 2010
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Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count Harold R. Zable and Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen - Petersen Advanced Lithography; Photomask Japan 2010
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ISQED Keynote now available - Design for E-Beam: Getting the Best Wafers Without the Exploding Mask Costs by Aki Fujimura, March 24, 2010
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Circles: One Key to Successful Lithography at Advanced Nodes by Aki Fujimura, February 23, 2010
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DFEB Methodology Guidelines for Physical Design Engineers now available
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ICCAD Tutorial now available - Beyond Light: The Growing Importance of E-Beam by Aki Fujimura, Nov. 2, 2009
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eBeam members presentation at EIPBN - May 29, 2009
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eBeam members presentation at MUSIC - April 2, 2009
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DFEB Technology Backgrounder
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Initiative Overview
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Fujitsu Viewpoint at Initiative Launch
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eSilicon Perspective on DFEB
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Photomask Japan 2010: The Award Winners of Best Paper have been announced. [May 31, 2010]
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SEMICON West 2010: E-Beam Lithography Seeks Investment Boost [May 27, 2010]
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Nikkei BP: 22nm以降のLSI製造用マスクを円形ビームで描画する技術,JEOLとD2Sが実機での評価結果を発表, [April 16, 2010]
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EuroAsia Semiconductor: Three new companies join eBeam Initiative [April 13, 2010]
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Semiconductor International Newsletter: D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production [April 13, 2010]
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Industry Insights, Cadence Design Systems: Has E-Beam Lithography Finally Found Its Niche? [April 8, 2010]
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ElectroIQ: Podcasts – Aki Fujimura, President & CEO of D2S makes the case for DFEB [March 30, 2010]
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