News & Events

  • eBeam Initiative Survey Indicates New eBeam Expectations for Photomask Production – Continued semiconductor scaling drives new mask design requirements; use of complex mask shapes predicted to increase, September 16, 2014
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  • Please RSVP - eBeam Initiative reception at BACUS 2014, Monterey Marriott, Tuesday, September 16, starting at 5:30pm including refreshments
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  • eBeam Initiative Announces Key Educational Themes for Photomask and Lithography Community for 2014 - Sage Design Automation becomes latest company to join eBeam Initiative, February 25, 2014
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  • Multibeam Technology Predicted for Use in Advanced Photomask Production by 2016 According to eBeam Initiative Survey – Hitachi High-Technologies Joins eBeam Initiative, September 9, 2013
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  • Please RSVP — eBeam Initiative reception at BACUS 2013, Monterey Marriott, Tuesday, September 10, 5:45-7:30pm including refreshments
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  • Semiconductor Industry Veterans from NVIDIA and Xilinx Join eBeam Initiative as Advisory Members, February 19, 2013
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  • eBeam Initiative Members Present Collaborative Results at SPIE BACUS Photomask Technology Symposium 2012, September 4, 2012
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  • Save the date – eBeam Initiative meeting during BACUS 2012, Monterey Marriott, Tuesday, September 11, 4-5:45pm including cocktails
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  • Listing of eBeam Initiative member papers, posters and panels at BACUS 2012, September 11-13, 2012
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  • HOYA Demonstrates eBeam Initiative Roadmap Milestone on Simultaneously Improving Quality and Reducing Write Times of Advanced Semiconductor Photomasks, April 16, 2012
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  • eBeam Initiative Roadmap to Focus on Semiconductor Photomask Critical Dimension Uniformity at SPIE Advanced Lithography 2012 Symposium – Proof Points at SPIE demonstrate the ability of eBeam Technologies to Improve 20-nm and 14-nm Wafer Yields, February 13, 2012
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  • eBeam Initiative Members Present Collaborative Results at SPIE/BACUS Photomask Symposium 2011 - Five Additional Companies Join eBeam Initiative, September 12, 2011
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  • Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask - D2S Option to NuFlare EBM-700 System Enalbes Design for E-Beam (DFEB) Mask Technology , March 1, 2011
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  • eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 - E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative, February 22, 2011
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  • eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 - Four New Members Join eBeam Initiative, September 7, 2010
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  • eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 - Three New Companies Join eBeam Initiative, April 13, 2010
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  • eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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  • eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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  • GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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  • Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
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  • eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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  • 20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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  • Members Quote Sheet
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FAQ

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eBeam Industry News

Semiconductor Engineering: The Week in Review: beaming survey [September 19, 2014]
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Semiconductor Engineering: Wanted: Multi-beam E-beam Inspection [September 18, 2014]
>> View

Semiconductor Engineering: What happened to next-gen lithography? [September 3, 2014]
>> View

Semiconductor Engineering: One-on-one with Linyong Pang: A behind the scenes look at inverse lithography, M&A activity and next-generation lithography [May 12, 2014]
>> View

Semiconductor Engineering: Stopping Mask Hotspots Before They Escape The Mask Shop – by Aki Fujimura, D2S CEO [April 28, 2014]
>> View

Semiconductor Engineering: One-on-One with Naoya Hayashi — Dai Nippon Photomask’s research fellow talks about rising challenges for the photomask industry. What happens when it takes 50 hours to write a mask? [March 20, 2014]
>> View

Semiconductor Engineering: Directed Self-Assembly Gains Momentum [March 20, 2014]
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