Graduated from Ecole Nationale Supérieure de Physique de Grenoble in 1992. After receiving his diploma, he received his PhD from CNET France Telecom on DUV resists study. He joined CEA-LETI in 1996 to work on infrared technology, then switched to the Microelectronics Department in 1999 to work on 193-nm and e-beam resist technology. In 2000, he jointed the Crolles site to participate in the development of the first 193-nm lithography cell. From 2001 to end 2007, he leaded at ST Crolles the e-beam direct-write lithography cell project. The objective of this activity is to realize, for example, early device architecture validation, prototyping, and customization. Since 2008, he is responsible at CEA-LETI of the lithography laboratory.