• Spring 2024 Fine Line Video Journal, March 26, 2024

  
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• eBeam Initiative Marks 15 Year Anniversary – FUJIFILM Corporation Joins the eBeam Initiative, February 27, 2024

  
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• eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 27, 2024

  
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• eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks, October 3, 2023

  
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• eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023

  
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• EUV TECH and IBM Join the eBeam Initiative, February 28, 2023

  
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• eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth, September 27, 2022

  
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• eBeam Initiative Annual Reception: Survey results 4:00-7:30pm September 27, 2022 Monterey, Calif., USA

  
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• Scanning Electron Microscopy Takes the Spotlight in Annual Deep Learning Survey by the eBeam Initiative - ESOL, Fractilia and HJL Lithography Join the eBeam Initiative, March 1, 2022

  
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• eBeam Initiative Virtual Annual Meeting, March 1, 2022

  
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• Replay of video - eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference, Sept. 28, 2021 Panelists are Tom Cecil (Synopsys), Chris Progler (Photronics) and Mikael Wahlsten (Mycronic), moderated by Aki Fujimura (D2S)
  >> View entire event (1h 22m)
  >> 2021 Luminaries survey results (14m)
  >> Mask revenues panel (12m)
  >> EUV mask panel (21m)
  >> Mask writers panel (12m)
  >> Deep Learning (DL) panel (10m)
  >> Curvilinear masks panel (6m)
  
  

• eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth, September 28, 2021

  
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• eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference, Sept. 28, 2021

  
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• PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura, April 21, 2021

  
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• Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021

  
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• Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020

  
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• eBeam Initiative Surveys Report Upbeat Photomask Market Outlook, September 22, 2020

  
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• Micron Joins the eBeam Initiative, February 25, 2020

  
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• eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020

  
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• eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations, September 16, 2019

  
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• eBeam Initiative Annual Reception: Survey results and more September 17, 2019 Monterey, Calif., USA

  
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• ASML Joins the eBeam Initiative, Feb 26, 2019

  
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• SPIE 2019: eBeam Initiative Annual Lunch and Members Meeting, San Jose Hilton, Tuesday, February 26, 2019

  
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• eBeam Initiative Surveys Report 27 Percent Growth in Photomasks Delivered and Continued Confidence in EUV Lithography; TEL Joins the eBeam Initiative, September 17, 2018

  
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• eBeam Initiative Annual Reception: Survey results and more September 18, Monterey, Calif., USA

  
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• LETI Innovation Days: Lithography Workshop July 6, Grenoble France

  
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• EMLC 2018: presentations by various eBeam Initiative members June 18-20, Grenoble, France

  
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• The Litho Workshop: presentations by eBeam Initiative members June 17-21, Sun Valley, Idaho, USA

  
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• Photomask Japan 2018: eBeam Initiative web sponsor and Aki Fujimura to present survey results April 19

  
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• CSTIC 2018: presentations by various eBeam Initiative members March 11

  
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• SPIE 2018: eBeam Initiative Annual Lunch and Members Meeting, San Jose Hilton, Tuesday, February 27, 2018

  
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• eBeam Initiative Surveys Report Greatly Increased Optimism for EUV Lithography and New Photomask Trends at Leading-Edge Process Nodes, September 11, 2017

  
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• SMIC Joins the eBeam Initiative as EUV Lithography and Multi-beam Mask Writing Become Key Themes for 2017, February 28, 2017

  
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• eBeam Initiative Survey Reports Confidence in EUV Lithography and Multi-beam Technology for High-Volume Semiconductor and Photomask Production [September 12, 2016]
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• BACUS 2016: eBeam Initiative Reception, San Jose Hilton, Monday, September 12, 2016
  
  

• Taiwan 2016: eBeam Initiative Taiwan Seminar, Hotel Royal Hsinchu, Wednesday, June 22, 11:45am registration, buffet lunch, presentations and drinks reception ending at 5pm
  
  

• Photomask Japan 2016: eBeam Initiative at Photomask Japan 2016 – banquet sponsor and Aki Fujimura to present survey results
  
  

• eBeam Initiative community to present at 2016 China Semiconductor Technology International Conference (CSTIC), Shanghai, [March 13-14, 2016]
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• eBeam Initiative to Expand Education Efforts on eBeam Technology Requirements for EUV and Nanoimprint Lithography, [February 23, 2016]
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• Events: Registration is closed as the event is at capacity - eBeam Initiative Luncheon at SPIE 2016, San Jose Hilton [February 23, 2016]
  
  

• eBeam Initiative Survey Indicates Rising Optimism in EUV Lithography and Multi-beam Technology for Photomask Production – ZEISS announced as new Initiative member [September 29, 2015]
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• eBeam Initiative Announces Education and Collaboration Focus on Reactivating Density Benefits of Moore’s Law – Holon and Photronics become latest companies to join eBeam Initiative [February 17, 2015]
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• Save the Date for the eBeam Initiative Workshop at Photomask Japan 2015, Pacifico Yokohama, Monday April 20, 3pm registration and beverages followed by workshop including dinner buffet ending at 7pm
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• eBeam Initiative members to present at China Semiconductor Technology International Conference (CSTIC) 2015 in Shanghai, China March 15-16, 2015
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• Please RSVP - eBeam Initiative Luncheon at SPIE 2015, San Jose Hilton, Tuesday, February 24, starting at 12:30pm
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• eBeam Initiative Survey Indicates New eBeam Expectations for Photomask Production – Continued semiconductor scaling drives new mask design requirements; use of complex mask shapes predicted to increase, September 16, 2014
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• Please RSVP - eBeam Initiative reception at BACUS 2014, Monterey Marriott, Tuesday, September 16, starting at 5:30pm including refreshments
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• eBeam Initiative Announces Key Educational Themes for Photomask and Lithography Community for 2014 - Sage Design Automation becomes latest company to join eBeam Initiative, February 25, 2014
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• Multibeam Technology Predicted for Use in Advanced Photomask Production by 2016 According to eBeam Initiative Survey – Hitachi High-Technologies Joins eBeam Initiative, September 9, 2013
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• Please RSVP — eBeam Initiative reception at BACUS 2013, Monterey Marriott, Tuesday, September 10, 5:45-7:30pm including refreshments
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• Semiconductor Industry Veterans from NVIDIA and Xilinx Join eBeam Initiative as Advisory Members, February 19, 2013
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• eBeam Initiative Members Present Collaborative Results at SPIE BACUS Photomask Technology Symposium 2012, September 4, 2012
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• Save the date – eBeam Initiative meeting during BACUS 2012, Monterey Marriott, Tuesday, September 11, 4-5:45pm including cocktails
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• Listing of eBeam Initiative member papers, posters and panels at BACUS 2012, September 11-13, 2012
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• HOYA Demonstrates eBeam Initiative Roadmap Milestone on Simultaneously Improving Quality and Reducing Write Times of Advanced Semiconductor Photomasks, April 16, 2012
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• eBeam Initiative Roadmap to Focus on Semiconductor Photomask Critical Dimension Uniformity at SPIE Advanced Lithography 2012 Symposium – Proof Points at SPIE demonstrate the ability of eBeam Technologies to Improve 20-nm and 14-nm Wafer Yields, February 13, 2012
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• eBeam Initiative Members Present Collaborative Results at SPIE/BACUS Photomask Symposium 2011 - Five Additional Companies Join eBeam Initiative, September 12, 2011
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• Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask - D2S Option to NuFlare EBM-700 System Enalbes Design for E-Beam (DFEB) Mask Technology , March 1, 2011
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• eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 - E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative, February 22, 2011
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• eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 - Four New Members Join eBeam Initiative, September 7, 2010
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• eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 - Three New Companies Join eBeam Initiative, April 13, 2010
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• eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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• eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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• GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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• Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
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• eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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• 20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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• Members Quote Sheet
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FAQ

• Download the eBeam FAQ (PDF)