Press: eBeam Initiative Survey Predicts Continued Growth in Photomask Market This Year - AGC Joins eBeam Initiative [September 23, 2025]
>> English,
Japanese,
Simplified Chinese &
Traditional Chinese
Videos: Summer 2025 Fine Line Video Journal [June 3, 2025]
>> View
Presentation: Full-Reticle Curvilinear Inline Linearity Correction Including Variable Bias with Zero Turnaround Time by Paris Spinelli, Micron, at PMJ 2025 [April 18, 2025]
>> View
Presentation: Three Ways to Improve Wafer Uniformity by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
>> View
Videos: Spring 2025 Fine Line Video Journal [March 26, 2025]
>> View
Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
>> View
Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative. Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
>> RSVP
Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
>> View
Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
>> View
Event:
eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025
Videos: Autumn 2024 Fine Line Video Journal [October 28, 2024]
>> View
Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
>> View
Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 24, 2026
>> RSVP
Presentation: A Memory Maker's Perspective on Advanced Lithography For DRAM Applications, Ezequiel Russell, Micron [February 24, 2026]
>> View
Presentation: Only Entirely Curvilinear Masks are Entirely Manufacturable Masks, Aki Fujimura, D2S [February 24, 2026]
>> View
Survey: 2026 Deep Learning/LLM Applications List by eBeam Initiative members [February 24, 2026]
>> View
Press:
eBeam Initiative Survey of Semiconductor Luminaries Predicts Photomask Market Growth and Increasing Investments in Mask Inspection and Multi-beam Mask Writing [October 1, 2024]
>> English,
Japanese,
Chinese &
Traditional Chinese
Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 1, 2024
>> View
Presentation: Lithography Technologies to Support High Performance Computing and Advancing AI by Toshiyuki Hisamura, Principal Member of Technical Staff for Silicon Technology at AMD [July 15, 2024]
>> View
Videos: Summer 2024 Fine Line Video Journal [June 18, 2024]
>> View
Videos: Spring 2024 Fine Line Video Journal [March 26, 2024]
>> View
Presentation: We’ve Come A Long Way in 15 Years by Aki Fujimura, CEO of D2S and co-founder of the eBeam Initiative [February 27, 2024]
>> View
Presentation: Cell Projection to Extend Shaped-Beam-Litho for New Applications by Matthias Slodowski, Vistec Electron Beam [February 27, 2024]
>> View
Press:
eBeam Initiative Marks 15 Year Anniversary – FUJIFILM Corporation Joins the eBeam Initiative [February 27, 2024]
>> English &
Japanese
Survey: 2024 Deep Learning Applications List by eBeam Initiative members [February 27, 2024]
>> View
Videos: 2023 eBeam Initiative Top Videos and Articles
>> View
Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 27, 2024
>> RSVP
Videos: Autumn 2023 Fine Line Video Journal [October 24, 2023]
>> View
Presentation: Economics of Mask by Glen Scheid, Micron [October 3, 2023]
>> View
Survey: eBeam Initiative Luminaries Survey Results [October 3, 2023]
>> View
Press: eBeam Initiative Survey Reports Semiconductor Industry Luminaries are Confident in High-NA EUV and Curvilinear Photomasks [October 3, 2023]
>> View
Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:45-7:15pm Oct. 3, 2023
>> RSVP
Presentation: DAC 2023 - Why is Curvy Design an Opportunity Now? Panel Slides [July 11, 2023]
>> View
Video: Summer 2023 Fine Line Video Journal [June 13, 2023]
>> View
Video: Photomask Japan – eBeam Initiative Update [April 24, 2023]
>> View
Tributes: Dr. Hans Pfeiffer, Industry and eBeam Luminary
>> View
Video: Spring 2023 Fine Line Video Journal [March 28, 2023]
>> View
Presentation: eBeam Lithography Misperceptions and Opportunities by David K. Lam, Multibeam Corporation, eBeam Initiative lunch [February 28, 2023]
>> View
Presentation: eBeam Inspection and Metrology: Developments and Applications in Lithography by Yu Cao, ASML, eBeam Initiative lunch [February 28, 2023]
>> View
Press:
EUV TECH and IBM Join the eBeam Initiative [February 28, 2023]
>> English,
Japanese,
Simplified Chinese &
Traditional Chinese
Survey: 2023 Deep Learning Applications List by eBeam Initiative members [February 28, 2023]
>> View
Videos: Winter 2023 Fine Line Video Journal [January 10, 2023]
>> View
Videos: Autumn 2022 Fine Line Video Journal [November 1, 2022]
>> View
Presentation: O(p): GPUs, Pixels, DL, Curvy Masks & Designs by Aki Fujimura, D2S, eBeam Initiative Reception [September 27, 2022]
>> View
Presentation: Curvilinear Masks in Memory for DUV and EUV by Ezequiel Russell, Micron, eBeam Initiative Reception [September 27, 2022]
>> View
Presentation: Curvilinear MPC in Zero Time by Noriaki Nakayamada, NuFlare, eBeam Initiative Reception [September 27, 2022]
>> View
Survey: 2022 eBeam Initiative Luminaries Survey Results [September 27, 2022]
>> View
Press:
eBeam Initiative Survey Reports EUV Fueling Photomask Industry Growth [September 27, 2022]
>> English,
Japanese,
Simplified Chinese &
Traditional Chinese
Event: eBeam Initiative reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 4:00-7:30pm Sept. 27, 2022
>> RSVP
Videos: Summer 2022 Fine Line Video Journal [June 28, 2022]
>> View
Videos: Spring 2022 Fine Line Video Journal [April 19, 2022]
>> View
Event: Replay of video - eBeam Initiative 14th Annual (Virtual) Event with Aki Fujimura of D2S, Donis Flagello of Nikon, Chris Mack of Fractilia, Harry Levinson of HJL Lithography, and Mike Hermes of Micron [March 1, 2022]
>> View
Press:
Scanning Electron Microscopy Takes the Spotlight in Annual Deep Learning Survey by the eBeam Initiative - ESOL, Fractilia and HJL Lithography Join the eBeam Initiative [March 1, 2022]
>> English,
Japanese,
Simplified Chinese &
Traditional Chinese
Survey: 2022 Deep Learning Applications List by eBeam Initiative members [March 1, 2022]
>> View
Videos: Autumn 2021 Fine Line Video Journal [October 26, 2021]
>> View
Event:
Replay of video - eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
View:
>> Entire event (1h 22m)
>> Luminaries survey results (14m)
>> Mask revenues (12m)
>> EUV mask (21m)
>> Mask writers (12m)
>> Deep Learning (DL) (10m)
>> Curvilinear masks (6m)
Survey: 2021 eBeam Initiative Luminaries Survey Results [September 28, 2021]
>> View
Press:
eBeam Initiative Survey Reports Continued Optimism for Photomask Market Growth [September 28, 2021]
>> English,
Japanese
Simplified Chinese &
Traditional Chinese
Event: eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference [Sept. 28, 2021]
>> RSVP
Video: Summer 2021 Fine Line Video Journal [June 22, 2021]
>> View
Event: PMJ 2021 eBeam Initiative Survey presentation by Aki Fujimura [April 21, 2021]
>> View
Video: Spring 2021 Fine Line Video Journal [March 23, 2021]
>> View
Event: Replay of video - eBeam Initiative Virtual Panel at SPIE-AL, February 23, 2021
>> View
Survey: 2021 Deep Learning Applications List by eBeam Initiative members [February 22, 2021]
>> View
Video: Autumn 2020 Fine Line Video Journal [October 20, 2020]
>> View
Event: Replay of video - eBeam Initiative Virtual Event during the 2020 Photomask Technology Conference, Sept. 22, 2020
>> View
Survey: 2020 eBeam Initiative Mask Makers' Survey Results [September 22, 2020]
>> View
Survey: eBeam Initiative Luminaries (formerly Perceptions) Survey Results [September 22, 2020]
>> View
Press:
eBeam Initiative Surveys Report Upbeat Photomask Market Outlook [September 22, 2020]
>> English,
Japanese &
Simplified Chinese
Video: Summer 2020 Fine Line Video Journal [June 2, 2020]
>> View
Video: Spring 2020 Fine Line Video Journal [March 29, 2020]
>> View
Press:
Micron Joins the eBeam Initiative [February 25, 2020]
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Presentation: ILT and Curvilinear Mask Designs for Advanced Memory Designs by Ezequiel Russell, Micron, at SPIE eBeam lunch [February 25, 2020]
>> View
Presentation: The Mycronic Path Back to Semiconductors and into Deep Learning, Mycronic, at SPIE eBeam lunch [February 25, 2020]
>> View
Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, co-sponsored in 2020 with CDLe, Tuesday, February 25, 2020
>> RSVP
Video: Autumn 2019 Fine Line Video Journal [October 14, 2019]
>> View
Survey:
2019 eBeam Initiative Mask Makers' Survey Results [September 17, 2019]
>> View
Survey:
eBeam Initiative Perceptions Survey Results [September 17, 2019]
>> View
Presentation: Digital Twins for a Curvilinear World by Leo Pang, D2S, at the eBeam Initiative Reception [September 17, 2019]
>> View
Press:
eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 17, 2019
>> RSVP
Video: Summer 2019 Edition of the Fine Line Video Journal [June 5, 2019]
>> View
Video: Spring 2019 Edition of the Fine Line Video Journal [March 26, 2019]
>> View
Presentation: The need for speed: Computations for EUV Lithography by Harry Levinson, HJL Lithography, at SPIE eBeam lunch [February 26, 2019]
>> View
Presentation: How GPU-Accelerated Simulation Enables Applied Deep Learning for Photomasks by Leo Pang, D2S, at SPIE eBeam lunch [February 26, 2019]
>> View
Presentation: Applications of Machine Learning in Computational Lithography by Yu Cao, ASML, at SPIE eBeam lunch [February 26. 2019]
>> View
Press:
eBeam Initiative Surveys Report Photomasks Being Written with Multi-beam Mask Writers and Growing Impact of Deep Learning on Semiconductor Fab Operations [September 16, 2019]
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Press:
ASML Joins the eBeam Initiative, Feb 26, 2019
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Event: eBeam Initiative Annual Lunch and Members Meeting at SPIE 2019, San Jose Hilton, Tuesday, February 26, 2019
>> RSVP
Video: Autumn 2018 Edition of the Fine Line Video Journal, October 16, 2018
>> View
Survey: 2018 eBeam Initiative Mask Maker Survey Results [September 18, 2018]
>> View
Survey: 2018 eBeam Initiative Perceptions Survey Results [September 18, 2018]
>> View
Presentation: Renew, Retire, Replace by Franklin Kalk, Toppan Photomasks, at BACUS eBeam Reception [September 18, 2018]
>> View
Press:
eBeam Initiative Surveys Report 27 Percent Growth in Photomasks Delivered and Continued Confidence in EUV Lithography; TEL Joins the eBeam Initiative, September 17, 2018
>> English,
Japanese,
Simplified Chinese,
& Traditional Chinese
Event: eBeam Initiative reception during the Photomask Technology Conference, Monterey, Calif.; Sept. 18 with Drinks reception at 5:45pm and program at 6:30pm
>> RSVP
Event: EMLC 2018 - presentations by various eBeam Initiative members June 18-20, Grenoble, France
>> View
Event: The Litho Workshop - presentations by eBeam Initiative members June 17-21, Sun Valley, Idaho, USA
>> View
Video: Summer 2018 Edition of the Fine Line Video Journal, June 7, 2018
>> View
Event: Photomask Japan 2018 - eBeam Initiative survey results to be presented April 19, 2018
>> View
Video: Spring 2018 Edition of the Fine Line Video Journal, March 21, 2018
>> View
Presentation: Multi-beam mask writer MBM-1000 for advanced mask making presented by Hiroshi Matsumoto, NuFlare Technology, at SPIE eBeam lunch [February 27, 2018]
>> Download PDF
Presentation: Frontiers in CD-SEM metrology presented by Sergey Babin, aBeam Technologies, at SPIE eBeam lunch [February 27, 2018]
>> Download PDF
Presentation: Mask patterning challenges for EUV N7 and beyond presented by Mike Green, Photronics, at SPIE eBeam lunch [February 27, 2018]
>> Download PDF
Events: eBeam Initiative Annual Lunch and Members Meeting at SPIE 2018, San Jose Hilton, Tuesday, February 27, 2018
>> RSVP
Events:
Leti Alternative Lithography Workshop with co-sponsors Screen and eBeam Initiative, San Jose Marriott, Thursday, March 1 from 5-9pm
>> Download PDF
>> RSVP
Videos: Autumn 2017 Edition of the Fine Line Video Journal, October 10, 2017
>> View
Video: Semiconductor Mask Making Trends… a conversation with Aki Fujimura of the eBeam Initiative by Dan Hutcheson [September 12, 2017]
>> View
Survey: 2017 eBeam Initiative Mask Maker Survey Results [September 11, 2017]
>> Download PDF
Survey: eBeam Initiative Perceptions Survey Results [September 11, 2017]
>> Download PDF
Presentation: What’s Different about EUV Masks? by Tom Faure from GLOBALFOUNDRIES, presented at eBeam Initiative “BACUS” Reception [September 11, 2017]
>> Download PDF
Press:
eBeam Initiative Surveys Report Greatly Increased Optimism for EUV Lithography and New Photomask Trends at Leading-Edge Process Nodes, September 11, 2017
>> Download PDF (English, Japanese, Traditional Chinese & Simplified Chinese)
Events: Save the Date for the 2017 eBeam Initiative BACUS Reception: Monday, September 11 from 5:15pm – 7:30pm in Monterey, California; Please RSVP by September 1 and we’ll send you the details!
>> RSVP
Videos: Summer 2017 Edition of the Fine Line Video Journal, June 26, 2017
>> View
Events: PMJ 2017 April 5 14:50-16:10 Session 3 Use of GPU in Mask Making (I); 16:30-18:00 Session 4 Use of GPU in Mask Making (II)
>> View
Events: PMJ 2017 Invited Talk April 5: “eBeam Initiative Survey Reports Confidence in EUV and Multi-beam Technology” Presenter: Aki Fujimura (eBeam Initiative)
>> View
Videos: Spring 2017 Edition of the Fine Line Video Journal, March 22, 2017
>> View
Events: CSTIC dinner hosted by the eBeam Initiative – pictured from the 52nd floor of the Ritz-Carlton in Shanghai, March 13, 2017
>> View
Presentation: The Resurgence of ILT by Tom Cecil, Synopsys, presented at eBeam Initiative SPIE 2017 Lunch, February 28, 2017
>> Download PDF
Presentation: Mask Modeling in the Multi-beam Era by Ryan Pearman, D2S, presented at eBeam Initiative SPIE 2017 Lunch, February 28, 2017
>> Download PDF
Presentation: eBeam at Light Speed for the EPE Metrology Era by Ofer Adan, Applied Materials, presented at eBeam Initiative SPIE 2017 Lunch, February 28, 2017
>> Download PDF
Press:
SMIC Joins the eBeam Initiative as EUV Lithography and Multi-Beam Mask Writing Become Key Themes for 2017, February 28, 2017
>> Download PDF (English, Japanese, Traditional Chinese & Simplified Chinese)
Events: Please RSVP � eBeam Initiative Annual Lunch and Members Meeting at SPIE 2017, San Jose Hilton, Tuesday, February 28, 2017
>> RSVP
Presentation: The Mask Industry is Ready for Curvilinear ILT by Leo Pang at the 2016 Lithography Workshop, November 10, 2016
>> Download PDF
Videos: Autumn 2016 Edition of the Fine Line Video Journal, October 12, 2016
>> Download PDF
Awards: Congratulations to Naoya Hayashi of DNP for receiving the Photomask Lifetime Achievement Award at BACUS 2016; read his �Meet the eBeamer� story below
>> Download PDF
Press:
eBeam Initiative Survey Reports Confidence in EUV Lithography and Multi-beam Technology for High-Volume Semiconductor and Photomask Production, September 12, 2016
>> Download PDF (English, Japanese, Traditional Chinese & Simplified Chinese)
Survey: 2016 eBeam Initiative Mask Maker Survey Results, September 12, 2016
>> Download PDF
Survey: 2016 eBeam Initiative Perceptions Survey Results, September 12, 2016
>> Download PDF
Presentation: Embedding IoT Chip Security using eBeam Solutions by Dr. David Lam, Multibeam Corporation, September 12, 2016
>> Download PDF
White Paper: GPU-Accelerated Computing: Maximizing Performance for the 24/7 Semiconductor Manufacturing Environment by Aki Fujimura, D2S, September 12, 2016
>> Download PDF
Events: Save the Date for the annual eBeam Initiative Reception at BACUS including survey results, Monday, September 12 with registration starting at 5:30pm at the Hilton San Jose Convention Center
>> RSVP
Presentation: Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at Taiwan Seminar on June 22, 2016
>> Download PDF
Presentation: Maglen eBeam Wafer Imaging System by Tony Luo, Maglen at Taiwan Seminar on June 22, 2016
>> Download PDF
Presentation: The Latest Progress in Model-based Mask Data Prep by Leo Pang, D2S at Taiwan Seminar on June 22, 2016
>> Download PDF
Videos: Summer 2016 Edition of the Fine Line Video Journal, May 24, 2016
>> Download PDF
Events: Save the Date for the eBeam Initiative Taiwan Seminar 2016, Hotel Royal Hsinchu, Wednesday, June 22, 11:45am registration, buffet lunch, presentations and drinks reception ending at 5pm
>> RSVP
Events: eBeam Initiative at Photomask Japan 2016 � banquet sponsor and Aki Fujimura to present survey results
>> View
Presentation: eBeam Initiative was a sponsor at CSTIC in Shanghai, March 13-14; The Latest Progress in Model-Based Mask Data Preparation by Leo Pang
>> Download PDF
Videos: Spring 2016 Edition of the Fine Line Video Journal, March 15, 2016
>> Download PDF
Presentation: Introduction and Recent Results of Multi-beam Mask Writer MBM-1000 by Hiroshi Matsumoto, NuFlare at SPIE on February 23, 2016
>> Download PDF
Presentation: 5nm Test Chip Design & Manufacturing Challenges by Praveen Raghavan, imec at SPIE on February 23, 2016
>> Download PDF
Presentation: The Challenges in Making NIL Master Templates by Naoya Hayashi, DNP at SPIE on February 23, 2016
>> Download PDF
Press:
eBeam Initiative to Expand Education Efforts on eBeam Technology Requirements for EUV and Nanoimprint Lithography, February 23, 2016
>> Download PDF (English, Japanese & Chinese)
Events: eBeam Initiative community to present at 2016 China Semiconductor Technology International Conference (CSTIC), Shanghai, March 13-14, 2016
>> View
Events: Registration is closed as the event is at capacity - eBeam Initiative Luncheon at SPIE 2016, San Jose Hilton, Tuesday, February 23
Videos: Autumn 2015 Edition of the Fine Line Video Journal, October 15, 2015
>> Download PDF
Presentation: Recent Progress of Electron Multi-Beam Mask Writer by Elmar Platzgummer, IMS at BACUS on September 29, 2015
>> Download PDF
Presentation: Mask Metrology in the ILT World by Leo Pang, D2S at BACUS on September 29, 2015
>> Download PDF
Survey: 2015 eBeam Initiative Perceptions Survey and Mask Makers Survey, September 29, 2015
>> Download PDF
Press: eBeam Initiative Survey Indicates Rising Optimism in EUV Lithography and Multi-beam Technology for Photomask Production � ZEISS announced as new Initiative member, September 29, 2015
>> Download PDF
Events: Save the Date - eBeam Initiative Reception at BACUS 2015, Monterey Marriott, Tuesday, September 29, starting from 5:30pm
>> RSVP
Videos: Summer 2015 Edition of the Fine Line Video Journal, June 3, 2015
>> Download PDF
Presentation: Conquering Heat Issues in Electron Beam Lithography � Past, Present and the Future by Noriaki Nakayamada of NuFlare Technology at PMJ Workshop on April 20, 2015
>> View
Presentation: Electron Beam-based Photomask Repair by Markus Waiblinger of Carl Zeiss, at PMJ Workshop on April 20, 2015
>> View
Presentation: Simulation-based Mask Inspection and Review for the 10nm Node and Beyond by Leo Pang of D2S, at PMJ Workshop on April 20, 2015
>> View
Event: Photo of attendees at the eBeam Initiative Luminary Dinner during the China Semiconductor Technology International Conference (CSTIC), March 16, 2015
>> View
Events: Save the Date for the eBeam Initiative Workshop at Photomask Japan 2015, Pacifico Yokohama, Monday April 20, 3pm registration and beverages followed by workshop including dinner buffet ending at 7pm
>> RSVP
Video: Tech Talk: Moore�s Law � Device scaling isn�t slowing down, but it is changing; Ed Sperling interviews Aki Fujimura, March 16, 2015
>> View
Videos: New issue of the Fine Line Video Journal, March 16, 2015
>> Download PDF
Presentation: Reactivating the Density Benefits of Moore�s Law - the eBeam Community Gears Up by Aki Fujimura, D2S, February 24, 2015
>> Download PDF
Presentation: Wafer Plane Analysis of Mask SEM in 2D & 3D by Takayuki Nakamura, Advantest, February 24, 2015
>> Download PDF
Presentation: Mask Maker�s Perspective on 10-nm Node by Chris Progler, Photronics, February 24, 2015
>> Download PDF
Press:
eBeam Initiative Announces Education and Collaboration Focus on Reactivating Density Benefits of Moore�s Law � Holon and Photronics become latest companies to join eBeam Initiative [February 17, 2015]
>> Download PDF (English & Japanese)
Events: eBeam Initiative members to present at China Semiconductor Technology International Conference (CSTIC) 2015 in Shanghai, China March 15-16, 2015
>> More
Events: Please RSVP - eBeam Initiative Luncheon at SPIE 2015, San Jose Hilton, Tuesday, February 24, starting at 12:30pm
>> RSVP
Paper: Fabrication of patterns with linewidths down to 1.5 nm by Dr. Sergey Babin � aBeam Technologies, Dr. Valeriy Yashchuk - LBNL, Dr. Ray Conley � Argonne National Laboratory [February 3, 2015]
>> Download PDF
Profile: Meet the eBeamers � Tom Faure, February 2015
>> Download PDF
Video: Semiconductor Engineering Tech Talk � Inverse Lithography by Leo Pang - D2S, December 11, 2014
>> More
Profile: Meet the eBeamers � Linyong (Leo) Pang, November 2014
>> Download PDF
Video: New issue of the Fine Line Video Journal, October 13, 2014
>> Download PDF
Profile: Meet the eBeamers – Hans Pfeiffer, September 2014
>> Download PDF
Survey: 2014 eBeam Initiative survey results, September 16, 2014
>> More
Presentation: Integrated Mask/Litho Signoff Verification using a Virtual VSB Writer by Bob Pack, GLOBALFOUNDRIES, September 16, 2014
>> Download PDF
Presentation: Impact of Context-Dependent Mask-Effects on Mask Hotspots by Aki Fujimura, D2S, September 16, 2014
>> Download PDF
Press:
eBeam Initiative Survey Indicates New eBeam Expectations for Photomask Production - Continued semiconductor scaling drives new mask design requirements; use of complex mask shapes predicted to increase, September 16, 2014
>> Download PDF (English & Japanese)
Profile: Meet the eBeamers - Brian Grenon, August 2014
>> Download PDF
Video: New issue of the Fine Line Video Journal - Summer 2014 edition, June 13, 2014
>> Download PDF
Profile: Meet the eBeamers - Naoya Hayashi, DNP, April 8, 2014
>> Download PDF
Video: New issue of the Fine Line Video Journal - Spring 2014 edition, March 18, 2014
>> Download PDF
Presentation: 2014 SPIE eBeam Initiative lunch presentations by D2S, DNP and Mentor Graphics, February 25, 2014
>> Download PDF
White Paper: Mask Hotspots Are Escaping the Mask Shop; Model-Based Mask Verification Can Stop Them, February 25, 2014
>> More
Press:
eBeam Initiative Announces Key Educational Themes for Photomask and Lithography Community for 2014 - Sage Design Automation becomes latest company to join eBeam Initiative, February 25, 2014
>> Download PDF (English & Japanese)
Profile: Meet the eBeamers - Dr. Laurent Pain, CEA-Leti, February 3, 2014
>> More
Events: Please RSVP - eBeam Initiative luncheon at SPIE 2014, Almaden ballroom, San Jose Hilton, Tuesday, February 25, 12:15-1:10pm
>> RSVP
Video: New issue of the Fine Line Video Journal - Autumn 2013 edition, October 15, 2013
>> Download PDF
Presentation: BACUS 2013 From Lines and Spaces to Patterns and Shapes by Dr. John Chen, NVIDIA, September 10, 2013
>> More
Presentation: BACUS 2013 GPU-Based MRC Methods for Overlapping eBeam Shots by Dr. Kokoro Kato, Hitachi High-Tech Science Corp, September 10, 2013
>> More
Survey: 2013 eBeam Initiative members survey results, September 10, 2013
>> More
Press:
Multibeam Technology Predicted for Use in Advanced Photomask Production by 2016 According to eBeam Initiative Survey - Hitachi High-Technologies Joins eBeam Initiative, September 9, 2013
>> Download PDF (English & Japanese)
Events: Please RSVP - eBeam Initiative reception at BACUS 2013, Monterey Marriott, Tuesday, September 10, 5:45-7:30pm including refreshments
>> RSVP
Video: New issue of the Fine Line Video Journal - Spring 2013 edition, May 20, 2013
>> Download PDF
Presentation: Photomask Japan 2013 panel presentation on challenges for future eBeam mask writers by Dr. Hiroshi Matsumoto, NuFlare.
>> More
Survey: Results presented during Photomask Japan 2013 panel - Future Mask Patterning Technologies in the Next Decade
>> More
Presentation: Photomask Japan 2013 panel presentation on multi-beam by Dr. Hans Loeschner, IMS Nanofabrication
>> More
Presentation: Photomask Japan 2013 panel presentation on eBeam simulation by Aki Fujimura, D2S
>> More
Events: eBeam Initiative members featured on Photomask Japan 2013 panel on Thursday, April 18
>> More
Presentation: SPIE 2013 eBeam Initiative lunch presentations by D2S, Xilinx and Toshiba, February 26, 2013
>> Download PDF
Video: Introducing the Fine Line Video Journal – Winter 2013 edition, February 19, 2013
>> Download PDF
Press:
Semiconductor Industry Veterans from NVIDIA and Xilinx Join eBeam Initiative as Advisory Members, February 19, 2013
>> Download PDF (English & Japanese)
Survey: eBeam Initiative 2012 survey results, Jan Willis, eBeam Initiative, September 11, 2012
>> Download PDF
Events: Join us at the 5th annual eBeam Initiative Luncheon at SPIE 2013, Tuesday, February 26, Market Room in the San Jose Hilton, 12:15pm-1:10pm
>> RSVP
Survey: eBeam Initiative 2012 survey results, Jan Willis, eBeam Initiative, September 11, 2012
>> Download PDF
Presentation: Printing results from a multi-beam mask exposure tool Elmar Platzgummer, IMS Nanofabrication, September 11, 2012
>> Download PDF
Presentation: Improving mask CDU using MB-MDP at 14nm and beyond, Byung-Gook Kim, Samsung, September 11, 2012
>> Download PDF
Presentation: Full-Chip MB-MDP is here, Aki Fujimura, D2S, September 11, 2012
>> Download PDF
Press:
eBeam Initiative Members Present Collaborative Results at SPIE BACUS Photomask Technology Symposium, September 4, 2012
>> Download PDF (English & Japanese)
Events: Save the date – eBeam Initiative meeting during BACUS 2012, Monterey Marriott, Tuesday, September 11, 4-5:45pm including cocktails
>> RSVP
Events: Listing of eBeam Initiative member papers, posters and panels at BACUS 2012, September 11-13, 2012
>> Download PDF
Education: PMJ 2012 Results of Proof-of-Concept 50keV electron multi-beam Mask Exposure Tool (eMET POC) by Elmar Platzgummer, Christof Klein, and Hans Loeschner, IMS Nanofabrication; April 2012
>> Download PDF
Presentation: Computational Lithography Requirements & Challenges for Mask Making by Naoya Hayashi, DNP Printing Co., Ltd., presented at the LithoVision technical symposium on February 12, 2012
>> Download PDF
Education: PMJ 2012 Results of Proof-of-Concept 50keV electron multi-beam Mask Exposure Tool (eMET POC) by Elmar Platzgummer, Christof Klein, and Hans Loeschner, IMS Nanofabrication; April 2012
>> Download PDF
Presentation: Computational Lithography Requirements & Challenges for Mask Making by Naoya Hayashi, DNP Printing Co., Ltd., presented at the LithoVision technical symposium on February 12, 2012
>> Download PDF
Education: 50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC), Christof Klein, Hans Loeschner, Elmar Platzgummer, IMS Nanofabrication, Proc. SPIE 8323, 83230G (2012)
>> More
Presentations: HOYA, GLOBALFOUNDRIES and D2S presentations at eBeam Initiative Luncheon during PMJ2012, April 19, 2012
>> Download PDF
Press: HOYA Demonstrates eBeam Initiative Roadmap Milestone on Simultaneously Improving Quality and Reducing Write Times of Advanced Semiconductor Photomasks, April 16, 2012
>> More
Events: PMJ 2012 eBeam Initiative Luncheon for members and guests, Thursday, April 19
>> RSVP
Presentations: eBeam Initiative SPIE 2012 presentations by D2S, Tela Innovations in collaboration with CEA-Leti, February 14, 2012
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Press: eBeam Initiative Roadmap to Focus on Semiconductor Photomask Critical Dimension Uniformity at SPIE Advanced Lithography 2012 Symposium - Proof Points at SPIE demonstrate the ability of eBeam Technologies to Improve 20-nm and 14-nm Wafer Yields, February 13, 2012
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Education: MB-MDP Enables Circular Shots to Improve Mask Accuracy as Well as Shot Count by Ryan Pearman and Robert Pack - D2S, Inc., February 13, 2012
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Events: eBeam Initiative Member Papers and Posters at SPIE 2012
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Events: SPIE 2012 eBeam Initiative Luncheon for members and guests, Tuesday, February 14
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Education: BACUS 2011 Paper - Reducing shot count through optimization-based fracture, Timothy Lin, Emile Sahouria, Nataraj Akkiraju, and Steffen Schulze. Proc. SPIE 8166, 81660T (2011); October 13, 2011
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Education: BACUS 2011 Poster Session - Assessment and comparison of different approaches for mask write time reduction,
A. Elayat, T. Lin, E. Sahouria, and S. F. Schulze,
Proc. SPIE 8166, 816634 (2011);
October 13, 2011
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Education: BACUS 2011 Best Poster - Optimization of mask shot count using MB-MDP and lithography simulation, September 20, 2011
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Education: BACUS 2011 Efficient large volume data preparation for electron beam lithography for sub-45nm node
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Presentations: eBeam Initiative BACUS event presentations by AMTC, D2S and GLOBALFOUNDRIES, including Best Poster presentation by Dr. Gek Soon Chua, GLOBALFOUNDRIES, September 20, 2011
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Press: eBeam Initiative Members Present Collaborative Results at SPIE/BACUS Photomask Symposium 2011 � Five Additional Companies Join eBeam Initiative, September 12, 2011
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Events: Save The Date: Tuesday, September 20th, 2011; 4:45-6:30pm, Monterey Marriott, Monterey, California, USA; The eBeam Initiative will hold its annual BACUS educational event and cocktail reception, open to members and guests.
>> RSVP to [email protected]
Events: Advanced Lithography TechXPOT featuring talks on EUV, Extended 193nm and E-beam at Semicon West, Moscone Center, San Francisco, CA, Wednesday, July 13, 2011, 10:30am-12:30pm.
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Events: D2S CEO Aki Fujimura will present "eBeam Direct Write: an idea whose time has come" at the 2011 NGL Workshop, Tokyo Institute of Technology, Tuesday, 9:30am - 9:55am, July 12
Education: IBM presentation at eBeam Initiative SPIE lunch, March 1, 2011
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Education: SPIE 2011 Model-Based Mask Data Prep (MB-MDP) and its effect on heating, March 2, 2011
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Education: SPIE 2011 E-beam Direct Write Overview, March 1, 2011
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Education: SPIE 2011 IMAGINE: An Open Consortium to Boost Maskless Lithography Take Off - First Assessment Results on Mapper Technology
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Press: Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Phototmasks - D2S Option to NuFlare EBM-7000 System Enables Design for E-Beam (DFEB) Mask Technology, March 1, 2011
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Education: NuFlare presentation at eBeam Initiative SPIE Lunch, March 1, 2011
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Education: D2S presentation at eBeam Initiative SPIE Lunch, March 1, 2011
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Education: Model-Based Mask Data Preparation Using Overlapping Shots: Making Optical Lithography Cost-effective for 20-nm Devices, March 1, 2011
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Press: eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 - E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative, February 22, 2011
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Events: Invitation to All Members - eBeam Initiative Luncheon at SPIE 2011; March 1, 2011 at the San Jose Hilton; Presentations by IBM, NuFlare Technology and D2S
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Education: BACUS 2010: Improvement of Mask Write Time for Curvilinear Assist Features at 22nm
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Education: BACUS 2010: Writing 32nm-hp Contacts with Curvilinear Assist Features
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Education: BACUS 2010: Impact of Model-Based Fracturing on E-beam Proximity Effect Correction Methodology
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Education: BACUS 2010: Design for e-beam: design insights for direct-write maskless lithography
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Education: MCA BrightSpots Lithography Forum - view or contribute blog comments, see the video of the BACUS panel and panelist interviews
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Education: eBeam Initiative Meeting Presentation at BACUS, September 14, 2010
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Press: eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 - Four New Members Join eBeam Initiative, September 7, 2010
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Events: Save The Date: Tuesday, September 14th, 2010; 4:30-6:30pm, Monterey Marriott, Monterey, California, USA; The eBeam Initiative will hold its semi-annual members meeting during BACUS 2010.
>> RSVP to [email protected]
Events: D2S CEO Aki Fujimura to participate in 22 nm manufacturing panel at DAC 2010 - Panel of Experts to Discuss Design and Lithography Challenges for 22 nm Manufacturing; 47th Design Automation Conference (DAC) at the Anaheim Convention Center in Anaheim, California, USA; Tuesday, June 15 from 10:30 a.m. to 11:30 a.m. at booth #694.
Education: Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, David Kim, Vikram Tolani and Tom Cecil - Luminescent Technologies; Photomask Japan 2010
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Education: Efficiently writing circular contacts on production reticle; Aki Fujimura - D2S, Christophe Pierrat - IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa - JEOL; Photomask Japan 2010
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Education: Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count Harold R. Zable and Aki Fujimura - D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen - Petersen Advanced Lithography; Photomask Japan 2010
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Press: eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 - Three New Companies Join eBeam Initiative, April 13, 2010
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Events: eBeam Initiative Sponsored Coffee Breaks, April 13; eBeam Initiative member papers, April 15 - Sessions 10 and 11; Photomask Japan
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Press: eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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Education: SPIE eBeam Initiative presentations - Samsung, D2S, Toppan Photomasks
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Education: Circles: One Key to Successful Lithography at Advanced Nodes by Aki Fujimura, February 23, 2010
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Press: eBeam Initiative Introduces Design for E-Beam Methodology Guidelines and Training Courses, November 9, 2009
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Education: DFEB Methodology Guidelines for Physical Design Engineers now available
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Education: ICCAD Tutorial now available - Beyond Light: The Growing Importance of E-Beam by Aki Fujimura, Nov. 2, 2009
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Winner Announced: Aaron Hand of Semiconductor International is the winner of the eBeam Initiative Puzzle contest. The mystery word was DFEB. Thanks to everyone who participated! October 1, 2009
Press: eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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Press: GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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Press: Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
>> MoreEvents: ICCAD Tutorial on E-beam Direct Write and Design for E-Beam, presented by Aki Fujimura, Chairman and CEO of D2S on Monday November 2, 2009, at the DoubleTree Hotel in San Jose, Calif.
Press: eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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Press: 20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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Press: Members Quote Sheet
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Education: SPIE 2009 paper now available - Cell projection use in maskless lithography for the 45-nm and 32-nm logic nodes [July 3, 2009]
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Education: eBeam members presentation at MUSIC now available here - Thursday, April 2, Santa Clara, CA
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Education: e-Shuttle and Fujitsu SPIE 2008 paper on EbDW
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Education: DFEB Technology Backgrounder
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Education: Initiative Overview
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Education: Fujitsu Viewpoint at Initiative Launch
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Education: eSilicon Perspective on DFEB
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