Videos: Spring 2026 Fine Line Video Journal [March 25, 2026]
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Presentation: Only Entirely Curvilinear Masks are Entirely Manufacturable Masks, Aki Fujimura, D2S [February 24, 2026]
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Survey: 2026 Deep Learning/LLM Applications List by eBeam Initiative members [February 24, 2026]
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Event: eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 24, 2026
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Videos: Autumn 2025 Fine Line Video Journal [November 5, 2025]
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Survey: 2025 eBeam Initiative Luminaries Survey Results [September 23, 2025]
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Presentation: Technology Analysis of Leading-Edge Semiconductor Manufacturing, Tetsuya Wadaki, Morgan Stanley MUFG [September 23, 2025]
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Press: eBeam Initiative Survey Predicts Continued Growth in Photomask Market This Year - AGC Joins eBeam Initiative [September 23, 2025]
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Japanese,
Simplified Chinese &
Traditional Chinese
Event: eBeam Initiative Reception during SPIE Photomask Technology + EUV Conference, Monterey, Calif.; 5:00–7:15pm Sept. 23, 2025
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Videos: Summer 2025 Fine Line Video Journal [June 3, 2025]
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Presentation: Full-Reticle Curvilinear Inline Linearity Correction Including Variable Bias with Zero Turnaround Time by Paris Spinelli, Micron, at PMJ 2025 [April 18, 2025]
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Presentation: Three Ways to Improve Wafer Uniformity by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
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Videos: Spring 2025 Fine Line Video Journal [March 26, 2025]
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Presentation: PLDC Improves Uniformity and Linearity for All Masks by Aki Fujimura, D2S [February 25, 2025]
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Event: Save the Date for the PMJ 2025 Finale hosted by the eBeam Initiative. Friday, April 18 right after the final session in the PMJ program and in the same room, the Annex Hall, Pacifico Yokohama.
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Press: eBeam Initiative Member Companies to Take Center Stage at SPIE Advanced Lithography and Patterning Conference [February 18, 2025]
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Survey: 2025 Deep Learning Applications List by eBeam Initiative members [February 18, 2025]
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Event:
eBeam Initiative SPIE-AL Annual Lunch and Members Meeting, Tuesday, February 25, 2025
Videos: Autumn 2024 Fine Line Video Journal [October 28, 2024]
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Survey: 2024 eBeam Initiative Luminaries Survey Results [October 1, 2024]
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Mission | The Initiative provides a forum for educational and promotional activities regarding a new design-to-manufacturing approach, known as Design for e-beam (DFEB), that reduces mask costs for semiconductor devices.
Technology | DFEB is a design and software approach to enhance the throughput of e-beam lithographic exposure. DFEB uses character projection (CP) technology combined with design and software techniques to reduce a design's required shot count, resulting in increased CP e-beam direct-write (EbDW) throughput.
Applications | Systems companies seeking all-layer custom SoC prototypes; low-to-mid-volume semiconductor companies producing maskless test chips, engineering samples, and derivative chips; and supercomputing applications.
Design Team Advisors | Provide business and technical insights and requirements to the Steering Group and Ecosystem members.
Marty Deneroff, D. E. Shaw Research
Jack Harding, eSilicon Corporation
Colin Harris, PMC-Sierra
Riko Radojcic, Qualcomm
Jean-Pierre Geronimi, STMicroelectronics
Semiecosystem: Latest News in Lithography by Mark LaPedus [June 7, 2026]
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Semiconductor Engineering: Curvilinear Masks Push the Limits of Inspection and Metrology [May 27, 2026]
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Semiconductor Engineering: Mask Technology Faces a New Set of Challenges
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Semiconductor Engineering: eBeam Initiative at SPIE ALP 2026 [April 16, 2026]
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Semiecosystem: Latest News in Lithography by Mark LaPedus [April 3, 2026]
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Semiconductor Engineering: Challenges in Scaling Chips to 2nm and Below by Ed Sperling [March 30, 2026]
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Semiconductor Digest: The Entirely Curvilinear Photomask Era Has Arrived [January 9, 2026]
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