Press: eBeam Initiative Members Present Collaborative Results at SPIE/BACUS Photomask Symposium 2011 Ð Five Additional Companies Join eBeam Initiative, September 12, 2011
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Events: Save The Date: Tuesday, September 20th, 2011; 4:45-6:30pm, Monterey Marriott, Monterey, California, USA; The eBeam Initiative will hold its annual BACUS educational event and cocktail reception, open to members and guests.
>> RSVP to requests@ebeam.org
Events: Advanced Lithography TechXPOT featuring talks on EUV, Extended 193nm and E-beam at Semicon West, Moscone Center, San Francisco, CA, Wednesday, July 13, 2011, 10:30am-12:30pm.
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Events: D2S CEO Aki Fujimura will present "eBeam Direct Write: an idea whose time has come" at the 2011 NGL Workshop, Tokyo Institute of Technology, Tuesday, 9:30am – 9:55am, July 12
Education: IBM presentation at eBeam Initiative SPIE lunch, March 1, 2011
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Education: SPIE 2011 Model-Based Mask Data Prep (MB-MDP) and its effect on heating, March 2, 2011
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Education: SPIE 2011 E-beam Direct Write Overview, March 1, 2011
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Education: SPIE 2011 IMAGINE: An Open Consortium to Boost Maskless Lithography Take Off - First Assessment Results on Mapper Technology
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Press: Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Phototmasks – D2S Option to NuFlare EBM-7000 System Enables Design for E-Beam (DFEB) Mask Technology, March 1, 2011
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Education: NuFlare presentation at eBeam Initiative SPIE Lunch, March 1, 2011
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Education: D2S presentation at eBeam Initiative SPIE Lunch, March 1, 2011
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Education: Model-Based Mask Data Preparation Using Overlapping Shots: Making Optical Lithography Cost-effective for 20-nm Devices, March 1, 2011
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Press: eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 – E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative, February 22, 2011
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Events: Invitation to All Members – eBeam Initiative Luncheon at SPIE 2011; March 1, 2011 at the San Jose Hilton; Presentations by IBM, NuFlare Technology and D2S
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Education: BACUS 2010: Improvement of Mask Write Time for Curvilinear Assist Features at 22nm
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Education: BACUS 2010: Writing 32nm-hp Contacts with Curvilinear Assist Features
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Education: BACUS 2010: Impact of Model-Based Fracturing on E-beam Proximity Effect Correction Methodology
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Education: BACUS 2010: Design for e-beam: design insights for direct-write maskless lithography
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Education: MCA BrightSpots Lithography Forum - view or contribute blog comments, see the video of the BACUS panel and panelist interviews
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Education: eBeam Initiative Meeting Presentation at BACUS, September 14, 2010
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Press: eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Members Join eBeam Initiative, September 7, 2010
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Events: Save The Date: Tuesday, September 14th, 2010; 4:30-6:30pm, Monterey Marriott, Monterey, California, USA; The eBeam Initiative will hold its semi-annual members meeting during BACUS 2010.
>> RSVP to requests@ebeam.org
Events: D2S CEO Aki Fujimura to participate in 22 nm manufacturing panel at DAC 2010 - Panel of Experts to Discuss Design and Lithography Challenges for 22 nm Manufacturing; 47th Design Automation Conference (DAC) at the Anaheim Convention Center in Anaheim, California, USA; Tuesday, June 15 from 10:30 a.m. to 11:30 a.m. at booth #694.
Education: Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa – JEOL, David Kim, Vikram Tolani and Tom Cecil – Luminescent Technologies; Photomask Japan 2010
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Education: Efficiently writing circular contacts on production reticle; Aki Fujimura – D2S, Christophe Pierrat – IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa – JEOL; Photomask Japan 2010
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Education: Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count Harold R. Zable and Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen – Petersen Advanced Lithography; Photomask Japan 2010
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Press: eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative, April 13, 2010
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Events: eBeam Initiative Sponsored Coffee Breaks, April 13; eBeam Initiative member papers, April 15 - Sessions 10 and 11; Photomask Japan
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Press: eBeam Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits, February 23, 2010
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Education: SPIE eBeam Initiative presentations - Samsung, D2S, Toppan Photomasks
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Education: Circles: One Key to Successful Lithography at Advanced Nodes by Aki Fujimura, February 23, 2010
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Press: eBeam Initiative Introduces Design for E-Beam Methodology Guidelines and Training Courses, November 9, 2009
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Education: DFEB Methodology Guidelines for Physical Design Engineers now available
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Education: ICCAD Tutorial now available - Beyond Light: The Growing Importance of E-Beam by Aki Fujimura, Nov. 2, 2009
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Winner Announced: Aaron Hand of Semiconductor International is the winner of the eBeam Initiative Puzzle contest. The mystery word was DFEB. Thanks to everyone who participated! October 1, 2009
Press: eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput, October 1, 2009
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Press: GenISys GMBH Joins the eBeam Initiative Roster to Accelerate the Adoption of Design for E-Beam Technology, Sept. 14, 2009
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Press: Silicon Results Validate Design for e-Beam Methodology at the 65-nm node, May 26, 2009
>> MoreEvents: ICCAD Tutorial on E-beam Direct Write and Design for E-Beam, presented by Aki Fujimura, Chairman and CEO of D2S on Monday November 2, 2009, at the DoubleTree Hotel in San Jose, Calif.
Press: eBeam Initiative Members to Present at Magma User Conference - March 26, 2009
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Press: 20 Electronics Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
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Press: Members Quote Sheet
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Education: SPIE 2009 paper now available - Cell projection use in maskless lithography for the 45-nm and 32-nm logic nodes [July 3, 2009]
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Education: eBeam members presentation at MUSIC now available here - Thursday, April 2, Santa Clara, CA
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Education: e-Shuttle and Fujitsu SPIE 2008 paper on EbDW
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Education: DFEB Technology Backgrounder
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Education: Initiative Overview
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Education: Fujitsu Viewpoint at Initiative Launch
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Education: eSilicon Perspective on DFEB
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